Skip to main content
Log in

Analysis of Application of the IDDQ Technique to the Deep Sub-Micron VLSI Testing

  • Published:
Journal of Electronic Testing Aims and scope Submit manuscript

Abstract

In this work, IDDQ current for the deep sub-micron VLSI in year 2011 is estimated with a statistical approach according to the International Technology Roadmap for Semiconductors 1999 Edition considering process variations and different input vectors. The estimated results show that the standard deviation of the IDDQ current is proportional to the square root of the circuit size and the IDDQ currents of the defect-free and the defective devices, which are of the size up to 1 × 107 gates, are still differentiable under the condition of random process deviations and input vectors. Two new IDDQ testing schemes, which detect the defective current based on the two separate IDDQ distributions, are proposed. From the study, it is concluded that IDDQ testing is still applicable for the deep sub-micron VLSI for the next ten years.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Similar content being viewed by others

References

  1. A. Ferr and J. Figueras, “IDDQ Characterization in Submicron CMOS,” in Proc. ITC, 1997, pp. 136–145.

  2. A.E. Gattiker and W. Maly, “Current Signarure: Application,” in Proc. International Test Conference, 1997, pp. 156–165.

  3. M. Levi, “CMOS is Most Testable,” in Proc. International Test Conference, 1981, pp. 217–220.

  4. C.W. Lu, C.L. Lee, J.E. Chen, and C. Su “ANewTesting Scheme Employing Charge Storage BICS Circuit for Deep Submicron CMOS ULSI,” in Proc. of International Workshop on IDDQ Testing, 1998, pp. 54–58.

  5. P.L. Meyer, Introductory Probability and Statiscal Applications, Addison-Wesley Publlishing Company, 1970.

  6. W. Nebel and J. Mermet, Low Power Design in Deep Submicron Electronics, Dordrecht: Kluwer Academic Publishers, 1997, p. 99.

    Google Scholar 

  7. R. Rodriguez-Montanes, E.M.J.G. Bruls, and J. Figueras, “Bridging Defects Resistance Measurements in a CMOS Process,” in Proc. ITC, 1992, pp. 892–899.

  8. The International Technology Roadmap for Semiconductors (ITRS) 1999 Edition.

  9. T.A. Unni and D.M.H. Walker, “Model-Based IDDQ PASS/ FAIL Limit Setting,” in Proc. of International Workshop on IDDQ Testing, 1998, pp. 43–47.

  10. T.W. Williams, R.H. Dennard, R. Kapur, M.R. Mercer, and W. Maly, “Iddq Test: Sensitivity Analysis of Scaling,” in Proc. ITC, 1996, pp. 786–792.

Download references

Author information

Authors and Affiliations

Authors

Rights and permissions

Reprints and permissions

About this article

Cite this article

Lu, CW., Lee, C.L., Su, C. et al. Analysis of Application of the IDDQ Technique to the Deep Sub-Micron VLSI Testing. Journal of Electronic Testing 18, 89–97 (2002). https://doi.org/10.1023/A:1013784124552

Download citation

  • Issue Date:

  • DOI: https://doi.org/10.1023/A:1013784124552

Navigation