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Synthesis of Thin Films with Controlled Absorption Using a Jet High-Frequency Induction Plasmatron

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Abstract

The authors investigate SiO x and TiO x (0 < x < 2) thin-film coatings with controlled absorption which are produced using a jet high-frequency plasma under conditions of dynamic vacuum.

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REFERENCES

  1. A. S. Vasil'ev, S. G. Gurevich, and Yu. S. Ioffe, Power Sources of Electrothermal Plants [in Russian], Moscow (1985).

  2. V. L. Dzyuba, G. Yu. Dautov, and I. Sh. Abdullin, Electric-Arc and High-Frequency Plasmatrons in Chemical-Metallurgy Processes [in Russian], Kiev (1991).

  3. I. Sh. Abdullin, V. S. Zheltoukhin, and N. F. Kashapov, in: M. Hrabovsky, M. Konrad, and V. Kopesky (eds.), ISPC-14, Vol. 3, Prague (1999), pp. 1339–1343.

  4. V. A. Gritsenko, Structure and Electronic Structure of Amorphous Dielectrics in Silicon Metal-Insulator-Semiconductor (MIS) Structures [in Russian], Novosibirsk (1993).

  5. Z. G. Meiksin, in: Physics of Thin Films [in Russian], Vol. 8, Moscow (1978), pp. 106–179.

    Google Scholar 

  6. V. M. Zolotarev, V. N. Morozov, and E. V. Smirnova, Optical Constants of Natural and Technical Media: Handbook [in Russian], Leningrad (1984).

  7. M. Born and É. Wolf, Principles of Optics [Russian translation], Moscow (1973).

  8. N. V. Grishina, Opt. Spektrosk., 72, Issue 4, 1033–1038 (1992).

    Google Scholar 

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Abdullin, I.S., Galyautdinov, R.T. & Kashapov, N.F. Synthesis of Thin Films with Controlled Absorption Using a Jet High-Frequency Induction Plasmatron. Journal of Engineering Physics and Thermophysics 74, 1196–1200 (2001). https://doi.org/10.1023/A:1012980200698

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