Abstract
Fluorinated thin layers were created on chemithermomechanical pulp (CTMP) sisal paper surfaces with fluorotrimethylsilane (FTMS) radio frequency-plasma conditions. It was found that the FTMS-discharge environments caused implantation of fluorine and –Si(CH3) x groups into the surface layers of the paper substrates. Attenuated Total Reflectance-Fourier Transform Infrared Spectroscopy and Electron Spectroscopy for Chemical Analysis, as well as Atomic Force Microscopy and Scanning Electron Microscopy analyses revealed a smooth surface for the FTMS plasma-treated paper, apparently covered completely with a cross-linked polymerized network. Although the plasma reaction takes place with the cellulose, hemicelluloses and lignin, it appears that the chemical linkage is mainly to the lignin component on the CTMP paper surface by means of mainly C–O–Si–F, with some C–Si–F structures. The CTMP fibers apparently have a high lignin surface concentration. The water absorption for the plasma-treated CTMP paper was reduced from greater than 300 to 17 g of water/m2 and the contact angle increased from less than 15° to greater than 120° the strength properties were only slightly reduced and the brightness was essentially unaffected with the FTMS plasma treatment.
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Navarro, F., Dávalos, F., Denes, F. et al. Highly hydrophobic sisal chemithermomechanical pulp (CTMP) paper by fluorotrimethylsilane plasma treatment. Cellulose 10, 411–424 (2003). https://doi.org/10.1023/A:1027381810022
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DOI: https://doi.org/10.1023/A:1027381810022