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Dielectric properties of silicon-doped α-alumina derived from sol–gel process

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Abstract

In this study, silicon-doped alumina (Al2O3) was synthesized using the sol–gel method. The composition and structure of silicon-doped alumina were analyzed using thermogravimetric-differential thermal analysis, X-ray diffraction, scanning electron microscopy, and X-ray photoelectron spectroscopy. As a result, it was found that the particle size of the silicon-doped alumina was uniform, and the silicon doped in the α-Al2O3 lattice occupied the space of the oxygen octahedron to form a structure based on the Al–O–Si bond. Also, because of measuring the change in dielectric constant according to the amount of doped silicon, a value of the dielectric constant of 3.1 at 1 GHz frequency when the silicon doping amount was 2%. Therefore, it is thought to be applicable to the fields of microelectronics, electronic packaging and interconnection, small antenna arrays, and capacitors that require low-k materials.

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Acknowledgements

This work was supported by the Korea Basic Science Institute (KBSI) National Research Facilities and Equipment Center (NFEC) grant funded by the Korea government (Ministry of Education) (No. 2019R1A6C1010031).

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Correspondence to Dae-Ho Yoon.

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Jeong, S.G., Wang, C., Kim, J.H. et al. Dielectric properties of silicon-doped α-alumina derived from sol–gel process. J. Korean Ceram. Soc. 59, 671–678 (2022). https://doi.org/10.1007/s43207-022-00206-z

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  • DOI: https://doi.org/10.1007/s43207-022-00206-z

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