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Amorphous phase stability of NbTiAlSiN X high-entropy films

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Abstract

In this study, high-entropy films with the composition of NbTiAlSiN X were prepared by a reactive direct current (DC) magnetron sputtering technique, with different nitrogen flow rates (0, 4 and 8 ml·min−1). The microstructures and properties were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), high-resolution transmission electron microscopy (HRTEM), nano-indenter and spectrophotometer. All of the as-deposited NbTiAlSiN X films are shown to have an amorphous structure, and the films exhibit high thermal stability up to 700 °C. The maximum hardness and modulus values of the films reach 20.5 GPa (4 ml·min−1) and 206.8 GPa (0 ml·min−1), respectively. The films exhibit high absorption of the solar energy in the wavelength of 0.3–2.5 μm, which indicates that NbTiAlSiN X nitride film is a potential candidate solar selective absorbing coating for high-temperature photo-thermal conversion in the concentrated solar power project.

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Acknowledgements

This study was financially supported by the National Natural Science Foundation of China (No. 51471025).

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Authors and Affiliations

  1. State Key Laboratory for Advanced Metals and Materials, University of Science and Technology Beijing, Beijing, 100083, China

    Wen-Jie Sheng, Xiao Yang, Jie Zhu & Yong Zhang

  2. Center for Condensed Matter and Materials Physics, Department of Physics, Beihang University, Beijing, 100191, China

    Cong Wang

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  1. Wen-Jie Sheng
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  2. Xiao Yang
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  4. Cong Wang
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  5. Yong Zhang
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Correspondence to Yong Zhang.

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Sheng, WJ., Yang, X., Zhu, J. et al. Amorphous phase stability of NbTiAlSiN X high-entropy films. Rare Met. 37, 682–689 (2018). https://doi.org/10.1007/s12598-016-0840-2

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  • DOI: https://doi.org/10.1007/s12598-016-0840-2

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