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Toward batch synthesis of high-quality graphene by cold-wall chemical vapor deposition approach

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Abstract

Chemical vapor deposition (CVD) has emerged as a promising approach for the controlled growth of graphene films with appealing scalability, controllability, and uniformity. However, the synthesis of high-quality graphene films still suffers from low production capacity and high energy consumption in the conventional hot-wall CVD system. In contrast, owing to the different heating mode, cold-wall CVD (CW-CVD) system exhibits promising potential for the industrial-scale production, but the quality of as-received graphene remains inferior with limited domain size and high defect density. Herein, we demonstrated an efficient method for the batch synthesis of high-quality graphene films with millimeter-sized domains based on CW-CVD system. With reduced defect density and improved properties, the as-received graphene was proven to be promising candidate material for electronics and anti-corrosion application. This study provides a new insight into the quality improvement of graphene derived from CW-CVD system, and paves a new avenue for the industrial production of high-quality graphene films for potential commercial applications.

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Acknowledgements

This work was financially supported by the National Natural Science Foundation of China (Nos. T2188101, 21525310, and 52072042), the National Key R&D Program of China (No. 2018YFA0703502), Beijing National Laboratory for Molecular Sciences (No. BNLMS-CXTD-202001), and Beijing Municipal Science & Technology Commission (Nos. Z181100004818001, Z18110300480001, Z18110300480002, Z191100000819005, Z191100000819007, and Z201100008720005).

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Author notes

  1. Kaicheng Jia, Ziteng Ma, Wendong Wang, and Yongliang Wen contributed equally to this work.

Authors and Affiliations

  1. Center for Nanochemistry, Beijing Science and Engineering Center for Nanocarbons, Beijing National Laboratory for Molecular Science, College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, China

    Kaicheng Jia, Ziteng Ma, Yeshu Zhu, Yuqing Song, Jiaxin Shao, Xiaoting Liu, Yixuan Zhao, Hailin Peng & Zhongfan Liu

  2. Beijing Graphene Institute, Beijing, 100095, China

    Kaicheng Jia, Ziteng Ma, Yeshu Zhu, Yuqing Song, Jiaxin Shao, Xiaoting Liu, Qi Lu, Yixuan Zhao, Jianbo Yin, Luzhao Sun, Hailin Peng, Jincan Zhang & Zhongfan Liu

  3. School of Physics and Astronomy, University of Manchester, Manchester, M13 9PL, UK

    Wendong Wang

  4. State Key Laboratory for Chemo/Biosensing and Chemometrics, College of Chemistry and Chemical Engineering, Hunan University, Changsha, 410082, China

    Yongliang Wen & Huanxin Li

  5. Department of Engineering, University of Cambridge, Cambridge, CB3 0FA, UK

    Huanxin Li & Jincan Zhang

  6. Academy for Advanced Interdisciplinary Studies, Peking University, Beijing, 100871, China

    Yeshu Zhu, Jiaxin Shao & Xiaoting Liu

  7. Key Laboratory of Opto-Electronics Technology, Ministry of Education, College of Electronic Science and Technology, Faculty of Information Technology, Beijing University of Technology, Beijing, 100024, China

    Jiawei Yang

  8. State Key Laboratory of Heavy Oil Processing, College of Science, China University of Petroleum, Beijing, 102249, China

    Qi Lu

  9. School of Materials Science and Engineering, Peking University, Beijing, 100871, China

    Li Lin

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  1. Kaicheng Jia
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  2. Ziteng Ma
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  5. Huanxin Li
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  11. Qi Lu
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  17. Li Lin
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Correspondence to Jincan Zhang, Li Lin or Zhongfan Liu.

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Jia, K., Ma, Z., Wang, W. et al. Toward batch synthesis of high-quality graphene by cold-wall chemical vapor deposition approach. Nano Res. 15, 9683–9688 (2022). https://doi.org/10.1007/s12274-022-4347-x

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  • DOI: https://doi.org/10.1007/s12274-022-4347-x

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