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Effect of Cr/Al Atomic Ratio on the Oxidation Resistance in 1200°C Steam for the CrAlSiN Coatings Deposited on Zr Alloy Substrates

  • Ceramic Materials for Nuclear Energy Applications
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Abstract

Cr-based physical vapor deposition coatings have been considered as having the potential to enhance the accident tolerance of Zr alloy fuel claddings. Comparative studies on the high-temperature oxidation behavior were conducted on the Zr alloy coupons that were coated with magnetron-sputtered CrAlSiN quaternary coatings with various Cr/Al atomic ratios. It has been found that the oxidation resistance and the external scale are closely associated with the Cr/Al atomic ratio. A Cr/Al ~ 3.1 coating provided effective protection for its Zr alloy substrate in 1200°C steam for 6 h, where a dense and homogeneous Cr2O3/α-Al2O3 bilayer scale was evidenced in the whole process. However, for Cr/Al ~ 1.3 and the Cr/Al ~ 0.6 coatings, their oxidation resistance was greatly degenerated, because of the forming of brittle α-Al2O3-rich scales. The results demonstrate that the Cr/Al atomic ratio is crucial to the protective capability of CrAlSiN coatings for Zr alloy coupons in high-temperature steam.

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Acknowledgements

This research is supported by the National Key Research and Development Program of China (2016YFB0700104), and the National Natural Science Foundation of China (No. 51871231).

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Authors and Affiliations

  1. Institute of Materials, School of Materials Science and Engineering, Shanghai University, Shanghai, 200444, China

    Han Zhu & Jun Yi

  2. Engineering Laboratory of Advanced Energy Materials, Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences, Ningbo, 315201, China

    Han Zhu, Haiyong Liu, Feng Huang & Fangfang Ge

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  1. Han Zhu
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  2. Haiyong Liu
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  3. Feng Huang
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  4. Jun Yi
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  5. Fangfang Ge
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Correspondence to Jun Yi or Fangfang Ge.

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Zhu, H., Liu, H., Huang, F. et al. Effect of Cr/Al Atomic Ratio on the Oxidation Resistance in 1200°C Steam for the CrAlSiN Coatings Deposited on Zr Alloy Substrates. JOM 71, 4839–4847 (2019). https://doi.org/10.1007/s11837-019-03839-4

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  • DOI: https://doi.org/10.1007/s11837-019-03839-4

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