Skip to main content
Log in

Improvement in Power Durability of Al Electrode Films Used in SAW Devices by Zr Additive and Ti Underlayer

  • Published:
Journal of Electronic Materials Aims and scope Submit manuscript

In order to improve the power durability of Al electrode films and obtain fine-dimensional control in high-frequency surface acoustic wave (SAW) devices, two-layered Al-Zr/Ti electrode films were investigated on 128°YX LiNbO3 substrates by sputter deposition. The results indicated that Al-Zr/Ti electrode films had improved electromigration (EM) reliability compared to Al/Ti electrode films and their lifetime was strongly dependent on the microstructure and Zr concentration. Al-Zr/Ti electrode films with a strong Al (111) texture exhibited longer EM lifetime than polycrystalline films. The Al-Zr/Ti electrode film with an ideal Zr concentration of 0.2 wt.% and a sputtering pressure of 0.25 Pa had a strong Al (111) texture, and its lifetime was approximately four times longer than that of Al/Ti films tested at a current density of 5 × 10A/cm2 at 200°C. Furthermore, the Al-Zr/Ti films were easily etched in reactive ion etching and fine-dimensional control was realized during pattern replication for high-frequency SAW devices.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Similar content being viewed by others

References

  1. Y. Takagaki, K.H. Ploog, Semicond. Sci. Technol. 20, 856 (2005)

    Article  CAS  Google Scholar 

  2. C.C. Sung, C.Y. Huang, Acoust. Phys. 52(3), 338 (2006)

    Article  Google Scholar 

  3. R. Takayama, M. Furukawa, Y. Murashima, IEEE Ultrason. Symp. Proc. 1, 5 (1998)

    Google Scholar 

  4. N. Kimura, M. Nakano, K. Sato, Electron. Lett. 34, 131 (1998)

    Article  CAS  Google Scholar 

  5. J. Yamada, J. Mater. Sci Electron. Mater. 14, 711 (2003)

    Article  CAS  Google Scholar 

  6. D.S. Park, Y.H. Kim, J. Electron. Mater. 31(10), 1009 (2002)

    Article  CAS  Google Scholar 

  7. O. Nakagawara, M. Saeki, M. Watanabe, J. Cryst. Growth. 249, 497 (2003)

    Article  CAS  Google Scholar 

  8. D.M. Li, F. Pan, J.B. Niu, J. Electron. Mater. 34, 1053 (2005)

    Article  CAS  Google Scholar 

  9. D.M. Li, X.B. Wang, F. Pan, Mater. Sci. Eng. A 418, 218 (2006)

    Article  Google Scholar 

  10. G.C.A.M. Janssen, Thin Solid Films 515, 6654 (2007)

    Article  CAS  Google Scholar 

  11. T.B. Massalski, Binary Alloy Phase Diagrams, Vol. 1 (The Materials Information Society, 1992), p. 241

  12. H. Shibata, M. Murota, K. Hashimoto, Jpn. J. Appl. Phys. 32, 4479 (1993)

    Article  CAS  Google Scholar 

  13. Y.B. Park, D.W. Lee, H.H. Ryu, J. Electron. Mater. 30(12), 1569 (2001)

    Article  CAS  Google Scholar 

  14. A. Yuhara, N. Hosaka, H. Watanabe, Proc. IEEE Ultrason. Symp. 1, 493 (1990)

    Article  Google Scholar 

  15. C.C. Lee, T.Y. Lee, Y.J. Jen, Thin Solid Films 359, 95 (2000)

    Article  CAS  Google Scholar 

  16. K.O. Schweitz, J. Arndt, J. Battiger, Nucl. Instr. Meth. B 127/l28, 809 (1997)

    Article  Google Scholar 

Download references

Author information

Authors and Affiliations

Authors

Corresponding author

Correspondence to Qiang Li.

Rights and permissions

Reprints and permissions

About this article

Cite this article

Li, D., Li, Q. & Pan, F. Improvement in Power Durability of Al Electrode Films Used in SAW Devices by Zr Additive and Ti Underlayer. J. Electron. Mater. 37, 180–184 (2008). https://doi.org/10.1007/s11664-007-0291-5

Download citation

  • Received:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1007/s11664-007-0291-5

Keywords

Navigation