Abstract
A1N thin films were reactively deposited onto Al layers on negatively biased glass and Si substrates at temperatures <80°C by coherent magnetron sputtering. The low temperature deposition of the films without substrate heating was achieved by increasing the target-to-substrate distance, and therefore the heating effect of the plasma is relieved. The microstructure and morphology of the films deposited at different bias voltage and target-to-substrate distance were investigated. The films are amorphous when the target is far from the substrate for a bias voltage up to −320V. When the target-to-substrate distance is decreased to 17 cm a preferred (002) orientation of AIN films is observed at a bias voltage of −240 V. Additionally, the deposited films have specular reflectance and no voids can be observed. This low temperature technique can be used for applications in acoustic wave devices due to the improved homogeneity of the films and step coverage.
Similar content being viewed by others
References
R.B. Stokes and J.D. Crawford, IEEE Trans. on Microwave Theory and Techniques 41, 1075 (1993).
K.M. Lakin, G.R. Kline, and K.T. McCarron, IEEE Trans. on Microwave Theory and Techniques 41, 2139 (1993).
L.G. Pearce, R.L. Gunshor, and R.F. Pierret, Appl. Phys. Lett. 39, 878 (1981).
M. Gadenne, J. Poln, and P. Gadenne, Thin Solid Films 333, 251 (1998).
K. Miernik, J. Walkowicz, and J. Smolik, Surface and Coatings Technol. 98, 1298 (1998).
H.C. Lee and J.Y. Lee, J. Mater. Sci.: Materials in Electronics 8, 385 (1997).
M. Pinza, M.F. De Riccardis, L. Mirenghi, M.A. Tagliente, and E. Verona, Thin Solid Films 259, 154 (1995).
T. Shiosaki, T. Yamamoto, T. Oda, and A. Kawabata, Appl. Phys. Lett. 36, 643 (1980).
S. Yoshida, S. Misawa, Y. Fujii, S. Takada, H. Hayakawa, S. Gonda, and A. Itoh, J. Vac. Sci. Technol. 16, 990 (1979).
M. Ishihara, H. Yumoto, T. Tsuchiya, and K. Akashi, Thin Solid Films 281, 321 (1996).
R.V. Joshi and S. Brodsky, Appl. Phys. Lett. 61, 2614 (1992).
Z. Lin and T.S. Cale, J. Vac. Sci. Technol. A 13, 2183 (1995).
T. Motohiro and Y. Taga, Thin Solid Films 112, 161 (1984).
B. Wang, Y.N. Zhao, and Z. He, Vacuum 48, 427 (1997).
H.C. Lee, K.Y. Lee, Y.J. Yong, J.Y. Lee, and G.H. Kim, Thin Solid Films 271, 50 (1995).
H.C. Lee, J.Y. Lee, and H.J. Ahn, Thin Solid Films 251, 136 (1994).
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Chu, A.K., Chao, C.H., Lee, F.Z. et al. Deposition of polycrystalline AIN thin films by coherent magnetron sputtering at temperatures <80°C. J. Electron. Mater. 30, 1–7 (2001). https://doi.org/10.1007/s11664-001-0206-9
Received:
Accepted:
Issue Date:
DOI: https://doi.org/10.1007/s11664-001-0206-9