The paper suggests dependences of the energy flux and specific energy onto the substrate on the pulse duty cycle during the dual magnetron-sputter deposition of the TiAlN coating. It is shown that the energy flux at the substrate increases by 20–30% with decreasing duty cycle from 40 to 6% at the constant average discharge power. Together with a decrease in the deposition rate at the high pulsed power, the specific energy grows sixfold on the substrate during the coating growth. The duty cycle can be thus considered as a way to control the energy flux onto the deposited coating, which affects its structure and properties. It is found that the TiAlN coating obtained at low duty cycle and high energy flux onto the substrate, possesses the high hardness and wear resistance.
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Translated from Izvestiya Vysshikh Uchebnykh Zavedenii, Fizika, No. 11, pp. 31–37, November, 2022.
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Grenadyorov, A.S., Zakharov, A.N., Oskirko, V.O. et al. Energy Flux at the Substrate During Dual Magnetron Sputtering of TiAlN Coating. Russ Phys J 65, 1825–1831 (2023). https://doi.org/10.1007/s11182-023-02837-z
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DOI: https://doi.org/10.1007/s11182-023-02837-z