Abstract
The removal of gaseous ethanethiol (EtSH) via dielectric barrier discharge (DBD) combined with 185 nm UV-light energized by a DBD power supply has been investigated. EtSH removal efficiency and energy yield had been examined as a function of EtSH initial concentration, input power, gas flow rate and relative humidity of gas flow. The results showed that DBD combined with 185 nm UV-light could improve EtSH removal efficiency by about 10.4 % and increase energy yield by 0.4 g (kWh)−1 as compared with DBD treatment only. When increasing initial EtSH concentration and flow rate, a higher energy yield was obtained. And EtSH removal efficiency increased as the relative humidity increased to about 70 %, then decreased when the humidity continue to increase. Moreover, the possible reaction pathways were proposed based on the products identified by FT-IR.
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Acknowledgments
The authors wish to thank the Scientific Research Foundation for the Returned overseas Chinese Scholars, Ministry of Education of China (2012JYLH0426) and the Fundamental Research Funds for the Central Universities (2014HGCH0007) for support this study.
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Zhu, C., Liu, Y., Lu, J. et al. Decomposition of Ethanethiol Using Dielectric Barrier Discharge Combined with 185 nm UV-Light Technique. Plasma Chem Plasma Process 35, 355–364 (2015). https://doi.org/10.1007/s11090-014-9609-2
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DOI: https://doi.org/10.1007/s11090-014-9609-2