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Erratum to: Plasma Chem Plasma Process DOI 10.1007/s11090-010-9278-8
In the online published article, it was neglected to note that the flow rates listed in the Table 1 for the DMSe flow were based on a nitrogen flow controller.
The nitrogen to DMSe flow rate conversion factor was not available for the MKS flow controller that was used. A conversion factor of 0.34 from a different flow controller manufacturer was recently found. The actual DMSe flow rate may be approximated by multiplying the table entry by 0.34. Thus for a flow rate of 5 sccm listed in the table for DMSe, the true flow rate is likely close to (0.34) × 5 sccm = 1.7 sccm.
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The online version of the original article can be found under doi:10.1007/s11090-010-9278-8.
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Whitham, P.J., Strommen, D.P., Lau, L.D. et al. Erratum to: Thin Film Growth of Germanium Selenides from PECVD of GeCl4 and Dimethyl Selenide. Plasma Chem Plasma Process 31, 257 (2011). https://doi.org/10.1007/s11090-011-9287-2
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DOI: https://doi.org/10.1007/s11090-011-9287-2