Abstract
Toluene removal is investigated in filamentary plasmas produced in N2 and in N2/O2 mixtures by a pulse high voltage energised DBD. Influence of the oxygen percentage (lower than 10%) and of the temperature (lower than 350°C) is examined. Toluene is removed in N2 through collisions with electrons and nitrogen excited states. The removal efficiency is a few higher in N2/O2. It increases when the temperature increases for N2 and N2/O2. Both H- and O-atoms play an important role in toluene removal because H can readily recombine with O to form OH, which is much more reactive with toluene than O. H follows from dissociation of toluene and of hydrogenated by-products by electron collisions. Detection of cyanhidric acid, acetylene, formaldehyde, and methyl nitrate strengthens that dissociation processes, to produce H and CH3, must be taken into account in kinetic analysis. Formation and treatment of deposits are also analysed.
Similar content being viewed by others
References
Koppmann R (ed) (2007) Volatile organic compounds in the atmosphere. Blackwell Publishing, Oxford
Van Winkle M, Scheff P (2001) Indoor Air 11:49
Krasnoperov L, Krishtopa L, Bozzelli W (1997) J Adv Oxid Technol 2:248
Vercammen K, Berezin A (1997) J Adv Oxid Technol 2:312
Rosocha L, Korzekwa R (1999) J Adv Oxid Technol 4:247
Yan K, van Heesch E, Pemen A, Huijbrechts P (2001) Plasma Chem Plasma Proc 21:107
Mok Y, Nam C, Cho M, Nam I-S (2002) IEEE Trans Plasma Sci 30:408
Pasquiers S (2004) Euro Phys J: Appl Phys 28:319
Kim H-H (2004) Plasma Process Polym 1:91
Van Durme J, Dewulf J, Leys C, Van Langenhove H (2008) Appl Catal B: Environ 78:324
Yamamoto T, Ramanathan K, Lawless P, Ensor D, Newsome J, Plaks N, Ramsey G (1992) IEEE Trans Ind Appl 28:528
Nunez C, Ramsey G, Ponder W, Abbot J, Hamel L, Kariher P (1993) Air Waste 43:242
Yamamoto T, Chang J-S, Berezin A, Kohno H, Honda S, Shibuya A (1996) J Adv Oxid Technol 1:67
Vitale S, Bromberg L, Hadidi K, Falkos P, Cohn D (1996) Chemtech 26:58
Chang M, Chang C-C (1997) Am Inst Chem Eng (AIChE) J 43:1325
Krasnoperov L, Krishtopa L, Bozzelli J (1997) J Adv Oxid Technol 2:248
Smulders E, van Heesch B, van Paasen S (1998) IEEE Trans Plasma Sci 26:1476
Kohno H, Berezin A, Chang J-S, Tamura M, Yamamoto T, Shibuya A, Honda S (1998) IEEE Trans Ind Appl 34:953
Falkenstein Z (1999) J Appl Phys 85:525
Sjöberg A, Teich T, Heinzle E, Hungerbühler K (1999) J Adv Oxid Technol 4:319
Pekàrek S, Kriha V, Pospisil M, Viden I (2001) J Phys D: Appl Phys 34:L117
Rudolph R, Francke K-P, Miessner H (2002) Plasma Chem Plasma Proc 22:401
Kang M, Kim B, Cho S, Chung C, Kim B, Han G, Yoon K (2002) J Mol Catal A 180:125
Ogata A, Ito D, Mizuno K, Kushiyama S, Gal A, Yamamoto T (2002) Appl Catal A 236:9
Song Y, Cha M, Kim Y, Kim K, Kim S, Han S, Choi K (2003) J Adv Oxid Technol 6:11
Koutsospyros A, Yin S, Christodoulatos C, Becker K (2004) Int J Mass Spect 233:305
Machala Z, Marode E, Morvova M, Lukac P (2005) Plama Process Polym 2:152
Harling A, Kil H-H, Futamura S, Whitehead J (2007) J Phys Chem C 111:5090
Guo Y, Ye D, Chen K, He J (2007) Catal Today 126:328
Demidyuk V, Whitehead J (2007) Plasma Chem Plasma Proc 27:85
Van Durne J, Dewulf J, Sysman W, Leys C, Van Langenhove H (2007) Chemosphere 68:1821
Hsiao M, Penetrante B, Merritt B, Vogtlin G, Wallman P (1997) J Adv Oxid Technol 2:306
Lombardi G, Blin-Simiand N, Jorand F, Magne L, Pasquiers S, Postel C, Vacher J-R (2007) Plasma Chem Plasma Proc 27:414
Magne L, Pasquiers S, Blin-Simiand N, Postel C (2007) J Phys D: Appl Phys 40:3112
Blin-Simiand N, Jorand F, Belhadj-Miled Z, Pasquiers S, Postel C (2007) Int J Plasma Environ Sci Technol 1:64
Blin-Simiand N, Magne L, Pasquiers S, Jorand F, Postel C (2007) 18th Int Symp Plasma Chem, Kyoto (Japan), contributed paper on CD-Rom
Molspec: Synthetic molecular spectra generator based on the HITRAN database. Laser Components GmbH, Olching, Germany. http://www.lasercomponents.com
Cantrell C, Davidson J, McDaniel A, Shetter R, Calvert J (1988) Chem Phys Lett 148:358
Korolevich M, Sivchik V, Zhbankov R, Lastochkina V (1986) J Appl Spectrosc 45:1275
Kossyi I, Kostinsky A, Matveyev A, Silakov V (1992) Plasma Sources Sci Technol 1:207
Mallard W, Westley F, Herron J, Hampson R, Frizzell D (1998) NIST Chemical kinetics database (version 2Q98)
Legrand J, Diany A, Hrach R, Hrachová V (1997) Beitr Plasma Phys 37:521
Tsai C, McFadden D (1990) J Phys Chem 94:3298
Herron J (1999) J Phys Chem Ref Data 28:1453
Meyer J, Klosterboer D, Setser D (1971) J Chem Phys 55:2084
Suzuki S, Suzuki T, Itoh H (2007) In: Proc 28th ICPIG, July 15–20, Prague, Czech Republic
Baulch D, Cobos C, Cox R, Frank P, Hayman G, Just Th, Kerr J, Murrells T, Pilling M, Troe J, Walker R, Warnatz J (1994) J Phys Chem Ref Data 23:847
Eliasson B (1983) Brown Boveri Forschungszentrum: electrical discharge in oxygen. Part I: basic data and rate coefficients. Report KLR 83-40C, Baden, Switzeland
Pignolet P, Hadj-Ziane S, Held B, Peyrous R, Benas J, Coste C (1990) J Phys D 23:1069
Atkinson R (1990) Atmos Environ 24A:1
Atkinson R, Baulch D, Cox R, Hampson R, Kerr J, Rossi M, Troe J (1999) J Phys Chem Ref Data 28:191
Master Chemical Mechanism, Leeds University, GB: http://www.mcm.leeds.ac.uk/MCM/
Eliasson B, Kogelschatz U (1991) IEEE Trans Plasma Sci 19:309
Ognier S, Cavadias S, Amouroux J (2007) Plasma Process Polym 4:528
Urashima K, Chang J, Ito T (1997) IEEE Ind Appl Soc Ann Meeting. New Orleans, USA
Frish MJ et al (1998) GAUSSIAN 98, Revision A.9. Gaussian Inc, Pittsburgh, PA
Piper L (1987) J Chem Phys 37:1625
Fresnet F, Baravian G, Magne L, Pasquiers S, Postel C, Puech V, Rousseau A (2000) Appl Phys Lett 77:4118
Fresnet F, Baravian G, Magne L, Pasquiers S, Postel C, Puech V, Rousseau A (2002) Plasma Sources Sci Technol 11:152
Aldrich Library of FTIR spectra: vapor phase. Edition 1. (1989) Aldrich Chemical Compagny, Inc.
Hayashi N, Suganuma H, Kamatani M, Satoh S, Yamabe C (2001) Jpn J Appl Phys 40:6104
Martin L, Ognier S, Daou F, Amouroux J (2005) High Temp Mat Proc 9:531
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Blin-Simiand, N., Jorand, F., Magne, L. et al. Plasma Reactivity and Plasma-Surface Interactions During Treatment of Toluene by a Dielectric Barrier Discharge. Plasma Chem Plasma Process 28, 429–466 (2008). https://doi.org/10.1007/s11090-008-9135-1
Received:
Revised:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s11090-008-9135-1