Abstract
Gallium sulfides are wide-gap materials (band gap in the range of 2.85–3.05 eV) that have great potential for applications in optoelectronics, photovoltaics, nonlinear optics, and energy storage. In this study, thin films of gallium sulfide GaxS1−x were prepared for the first time by plasma-enhanced chemical vapor deposition using a transport reaction involving chlorine. High-purity elemental gallium and sulfur were directly used as starting materials. The non-equilibrium low-temperature plasma of the RF discharge (40.68 MHz) initiated chemical transformations. The effect of plasma power on the composition, structure, surface morphology, and optical properties of the films was studied. GaxS1−x films have sufficiently high transparency in the visible and near-IR ranges (up to 70%).
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Acknowledgements
The SEM studies were performed by the Shared Use Center “New Materials and Resource-saving Technologies” (Lobachevsky University).
Funding
This work was supported by RSF, Grant No. 22-19-20081 «Development of scientific and technological fundamentals of synthesis of the functional nanostructured semiconductor materials based on gallium chalcogenides for applications in electronics, optoelectronics, spintronics and catalysis», https://rscf.ru/project/22-19-20081/.
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LM and MK wrote the main manuscript text, MV and IP prepared all figures, YK, PM and ES did the experimental work. All authors reviewed the manuscript.
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Mochalov, L., Kudryashov, M., Vshivtsev, M. et al. Plasma-enhanced chemical vapor deposition of GaxS1−x thin films: structural and optical properties. Opt Quant Electron 55, 909 (2023). https://doi.org/10.1007/s11082-023-05165-1
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DOI: https://doi.org/10.1007/s11082-023-05165-1