Abstract
Lead sulfide (PbS) thin films of different morphology were synthesized via direct interaction of lead and sulfur vapors. Low temperature nonequilibrium RF (40.68 MHz) plasma discharge at low pressure ((3–5) × 10–3 Torr) was used for the initiation of chemical interaction between precursors in the gas phase. The in-situ Optical Emission Spectroscopy (OES) was utilized to determine the exited reactive species existing in plasma discharge and possible mechanism of plasma-chemical reactions resulting in the formation of the solid phase. The chemical composition, structure and morphology of the surface of the as-deposited materials in dependence of parameters of the plasma process such as stoichiometry of the precursors in the gas phase, power of the plasma discharge and substrate temperature were characterized by SEM, XRD and AFM analytical techniques. The optical properties and electrophysical parameters of the samples were studied as well.
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Acknowledgements
The reported study was supported by the Russian Science Foundation, Grant No 19-79-10124 «Development of scientific fundamentals of the plasma-chemical synthesis of a new generation of the functional materials for the mid-IR range». The X-ray microanalysis and scanning electron microscopy were carried out on the equipment of the Collective Usage Centre "New Materials and Resource-saving Technologies" (Chemistry Research Institute of Lobachevsky State University of Nizhny Novgorod).
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Mochalov, L., Logunov, A., Prokhorov, I. et al. Plasma-Chemical Synthesis of Lead Sulphide Thin Films for Near-IR Photodetectors. Plasma Chem Plasma Process 41, 493–506 (2021). https://doi.org/10.1007/s11090-020-10123-w
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DOI: https://doi.org/10.1007/s11090-020-10123-w