Results of studies of the influence of the energy of the probe electrons in the range 0.3–20 keV on the image of a line width test object in the nanometric range in a scanning electron microscope are presented. It is shown that the range of energies of the primary electrons may be divided into three sub-ranges. At electron energies less than 2.5 keV (low-voltage operating mode) and greater than 10 keV (high-voltage operating mode) the image that is formed in the course of collecting secondary slow electrons can be used to take measurements of the line width of a test object by means of known methods. For the intermediate range of energies of the primary electrons, there are no methods that may be used to measure the line width.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
M. T. Postek and A. E.Vladar, Critical Dimension Metrology and the Scanning Electron Microscope: Handbook of Silicon Semiconductor Metrology (A. C. Diebold, ed.), Marcel Decker, Basel–New York (2001), p. 295.
Y. Nakayama, S. Okazaki, and A. Sugimoto, J. Vac. Sci. Technol., B6, 1930 (1988).
Yu. A. Novikov and A. V. Rakov, Mikroelektronika, 25, No. 6, 417 (1996).
Yu. A. Novikov and A. V. Rakov, Mikroelektronika, 25, No. 6, 426 (1996).
Yu. A. Novikov, A. V. Rakov, and P. A. Todua, Proc. SPIE, 6260, 626013-1 (2006).
Yu. A. Novikov, S. V. Peshekhonov, and I. B. Strizhkov, Tr. IOFAN, 49, 20 (1995).
M. A. Danilova et al., Izmer. Tekhn., No. 9, 49 (2008); Measur. Techn., 51, No. 9, 605 (2008).
Ch. P. Volk et al., Mikroelektronika, 31, No. 4, 243 (2002).
Yu. A. Novikov et al., Proc. SPIE, 6648, 648OR-1 (2007).
Ch. P. Volk et al., Tr. IOFAN, 62, 77 (2006).
Ch. P. Volk et al., Mikroelektronika, 33, No. 6, 419 (2004).
Ch. P. Volk et al., Izmer. Tekhn., No. 6, 18 (2008); Measur. Techn., 51, No. 6, 998 (2008).
V. P. Gavrilenko et al., Proc. SPIE, 7042, 7042OC-1 (2008).
GOST R 8.631-2007, GSI: Nanometric Relief Measurers: Requirements for Geometric Form, Linear Dimensions, and Selection of Material for Manufacture [in Russian].
Yu. A. Novikov, A. V. Rakov, and M. N. Filippov, Izv. Ross. Akad. Nauk. Ser. Fizicheskaya, 62, No. 3, 543 (1998).
Yu. A. Novikov and A. V. Rakov, Tr. IOFAN, 55, 3 (1998).
Author information
Authors and Affiliations
Corresponding author
Additional information
Translated from Izmeritel’naya Tekhnika, No. 7, pp. 20–23, July, 2007.
Rights and permissions
About this article
Cite this article
Volk, C.P., Mityukhlyaev, V.B., Novikov, Y.A. et al. The image of a line width test object in a scanning electron microscope with different energies of the probe electrons. Meas Tech 52, 713–718 (2009). https://doi.org/10.1007/s11018-009-9350-z
Received:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s11018-009-9350-z