Abstract
Recently, torsional oscillator (Yamamoto et al. in Phys. Rev. Lett. 93:075302, 2004) and ultrasound (Kobayashi et al. in AIP Conf. Proc. 128:797, 2007) measurements were carried out for pressurized 4He filled in a nanoporous glass (Gelsil), and the superfluid transition temperature T C shows a different pressure dependence. Thus motivated, we have performed simultaneous measurements with a torsional oscillator and with ultrasound for pressurized 4He in Gelsil. T C is in agreement between the two techniques at all pressures, and the superfluid component above 0.5 K shows most of the same temperature dependence. Furthermore, it was found that the χ-factor (the fraction of superfluid which remains locked to the substrate ) is independent of measuring frequency between the torsional oscillator (kHz-order) and the ultrasound (MHz-order) ranges.
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References
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The Gelsil sample was manufactured by Geltech Co., 3267 Progress Drive, Orlando, FL 32826, USA
T. Kobayashi, A. Saito, J. Taniguchi, M. Suzuki, K. Shirahama, in preparation
J.R. Beamish, N. Mulders, A. Hikata, C. Elbaum, Phys. Rev. B 44, 9314 (1991)
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Kobayashi, T., Saito, A., Taniguchi, J. et al. Simultaneous Measurements of an Ultrasound and a Torsional Oscillator for Pressurized 4He in a Nanoporous Glass. J Low Temp Phys 158, 250–255 (2010). https://doi.org/10.1007/s10909-009-0048-z
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DOI: https://doi.org/10.1007/s10909-009-0048-z