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Microstructure and resolution of etched patterns of Photoresist (AZP4620) layers spin-coated under artificially elevated gravity accelerations by two-axis spin coating technology

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Abstract

The resolution of miniaturized photoresist patterns plays a vital role in the microelectronic industries. This study investigates the quality of photoresist (AZP4620) etched patterns spin-coated under gravity conditions. The elevation of gravity acceleration is artificially exerted within a two-axis spin coater. The evaporation rate of photoresist solvents under natural and elevated gravity accelerations is measured and discussed. An FTIR characterizes the microstructure of films synthesized under various gravity conditions (1, 100, 200, and 300 g). A designed mask’s patterns are directly exposed to the fabricated films by UV light within a photolithography method. The exposed patterns are finally etched in a developer. The surface and cross-section of miniaturized etched patterns are imaged by an SEM, which shows enhancements in the resolution of the etched patterns spin-coated under a higher gravity field. The evaporation rate of the photoresist increased while elevating the gravity acceleration. The elevation of gravity can be a dominant force in changing the crystalline structure of photoresists. FTIR shows a decrease in the lighter chemical bonds, such as gases, where the coated films synthesize under higher gravity acceleration.

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The datasets generated and analyzed during this study are included in this article and are available from the corresponding author upon reasonable request.

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Authors and Affiliations

  1. Yancheng Teachers University, Yancheng, 224000, Jiangsu, China

    Soroosh Mahmoodi

  2. Jiangxi Key Laboratory of Power Batteries and Materials, Faculty of Materials Metallurgy and Chemistry, Jiangxi University of Science and Technology, Ganzhou, 341000, China

    Soroosh Mahmoodi

  3. Soroosh Khorshid Iranian Co, Abyek Industrial Zone, Qazvin, Iran

    Soroosh Mahmoodi

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  1. Soroosh Mahmoodi
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Contributions

All authors contributed to the study’s conception and design. Material preparation, data collection, and analysis were performed by [SM]. The first draft of the manuscript was written by [SM]. All authors read and approved the final manuscript.

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Correspondence to Soroosh Mahmoodi.

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Mahmoodi, S. Microstructure and resolution of etched patterns of Photoresist (AZP4620) layers spin-coated under artificially elevated gravity accelerations by two-axis spin coating technology. J Mater Sci: Mater Electron 34, 550 (2023). https://doi.org/10.1007/s10854-023-09981-9

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  • DOI: https://doi.org/10.1007/s10854-023-09981-9

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