Abstract
The wide energy gap compound semiconductors, gallium nitride and zinc oxide, are widely recognized as promising materials for novel electronic and optoelectronic device applications. As informed device design requires a firm grasp of the material properties of the underlying electronic materials, the electron transport that occurs within these wide energy gap compound semiconductors has been the focus of considerable study over the years. In an effort to provide some perspective on this rapidly evolving field, in this paper we review analyzes of the electron transport within the wide energy gap compound semiconductors, gallium nitride and zinc oxide. In particular, we discuss the evolution of the field, compare and contrast results determined by different researchers, and survey the current literature. In order to narrow the scope of this review, we will primarily focus on the electron transport within bulk wurtzite gallium nitride, zinc-blende gallium nitride, and wurtzite zinc oxide. The electron transport that occurs within bulk zinc-blende gallium arsenide will also be considered, albeit primarily for bench-marking purposes. Most of our discussion will focus on results obtained from our ensemble semi-classical three-valley Monte Carlo simulations of the electron transport within these materials, our results conforming with state-of-the-art wide energy gap compound semiconductor orthodoxy. A brief tutorial on the Monte Carlo electron transport simulation approach, this approach being used to generate the results presented herein, will also be featured. Steady-state and transient electron transport results are presented. We conclude our discussion by presenting some recent developments on the electron transport within these materials. The wurtzite gallium nitride and zinc-blende gallium arsenide results, being presented in a previous review article of ours (O’Leary et al. in J Mater Sci Mater Electron 17:87, 2006), are also presented herein for the sake of completeness.
Similar content being viewed by others
Notes
The earliest recorded studies on GaN, reported in the 1920s and 1930s, were performed on small crystals and powders [23]. Unfortunately, these materials were of insufficient quality for device applications. Thus, GaN remained a material of widely recognized but unrealized potential for many years. It was only when modern deposition approaches, such as molecular beam epitaxy and metal-organic chemical vapor deposition, were employed for the preparation of GaN that this material approached the levels of quality demanded of devices. Thus, intense interest into the material properties of GaN only really began in earnest in the early-1990s. While initial reports on the material properties of ZnO were made in the 1920s and 1930s, it was only much later that the quality of the material became sufficiently high that a diverse range of device applications could be considered. Accordingly, interest in the material properties of ZnO began in earnest in the early-2000s. Interest in both of these materials, and the device applications thus engendered, continues today.
This requires that the electron ensemble has settled on a new equilibrium state. By an equilibrium state, however, we are not necessarily referring to thermal equilibrium, thermal equilibrium only being achieved in the absence of an applied electric field.
By electron drift velocity, we are referring to the average electron velocity, determined by statistically averaging over the entire electron ensemble.
The Monte Carlo approach to simulating the electron transport within semiconductors has been employed by many authors. A Monte Carlo electron transport simulation resource, with code included, may be found at https://nanohub.org/resources/moca. Further information about the Monte Carlo approach, beyond the electron transport context, may also be found at http://www.codeproject.com/Articles/767997/Parallelised-Monte-Carlo-Algorithms-sharp and http://www.codeproject.com/Articles/32654/Monte-Carlo-Simulation?q=Monte+Carlo+code.
The conduction band minima may be degenerate, i.e., the same conduction band energy minima may be achieved at multiple points throughout the conduction band band structure. Valley 1 corresponds to those conduction band minima that are at the lowest energy. Valleys 2 and 3 correspond to those conduction band minima at the second most and third most lowest energy minima, respectively.
Albrecht et al. [82] generalize this relationship in order to include a second-order non-parabolocity coefficient that reduces to the traditional Kane model in the limit that this second-order non-parabolocity coefficient is set to zero.
The longitudinal and transverse sound velocities are equal to
$$\sqrt{\frac{C_{l}}{\rho }} \quad \hbox {and}\quad \sqrt{\frac{C_{t}}{\rho }},$$respectively, where \(C_{l}\) and \(C_{t}\) denote the respective elastic constants and \(\rho \) represents the density.
Piezoelectric scattering is treated using the well established zinc-blende scattering rates, and thus, a suitably transformed piezoelectric constant, \(\hbox {e}_{14}\), must be selected. This may be achieved through the transformation suggested by Bykhovski et al. [149, 150]. The \(\hbox {e}_{14}\) value selected for wurtzite GaN is that suggested by Chin et al. [86]. The \(\hbox {e}_{14}\) values selected for zinc-blende GaN and wurtzite ZnO is that corresponding to wurtzite GaN.
All inter-valley deformation potentials are set to \(10^{9}\) eV/cm, following the approach of Gelmont et al. [85].
The band structures are specified according to the three lowest energy conduction band valley minima, each minima corresponding to a valley, their locations in the band structures, the degeneracy of each valley, the effective mass of the electrons at each valley minimum, and the non-parabolicity coefficient corresponding to each valley being specified.
For the case of direct-gap semiconductors, the \(E_{o}\) energy gap corresponds with the regular energy gap, \(E_{g}\). For the case of indirect-gap semiconductors, however, the \(E_{o}\) energy gap exceeds \(E_{g}\).
Interest in the material properties of ZnO was ignited later than that associated with GaN, primarily on account of material quality considerations, i.e., high-quality GaN was prepared earlier, and a lack of familiarity with means of effectively handling II–VI compound semiconductors, many GaN processing techniques being borrowed directly from the GaAs case.
References
M.N. Yoder, IEEE Trans. Electron Devices 43, 1633 (1996)
D. Jones, A.H. Lettington, Solid State Commun. 11, 701 (1972)
P. Das, D.K. Ferry, Solid State Electron. 19, 851 (1976)
B.J. Baliga, IEEE Electron Device Lett. 10, 455 (1989)
M. Bhatnagar, B.J. Baliga, IEEE Trans. Electron Devices 40, 645 (1993)
T.P. Chow, R. Tyagi, IEEE Trans. Electron Devices 41, 1481 (1994)
J.W. Milligan, S. Sheppard, W. Pribble, Y.-F. Wu, St. G. Müller, J.W. Palmour, in Proceedings of the 2007 IEEE Radar Conference (2007), p. 960
A. BenMoussa, A. Soltani, U. Schühle, K. Haenen, Y.M. Chong, W.J. Zhang, R. Dahal, J.Y. Lin, H.X. Jiang, H.A. Barkad, B. BenMoussa, D. Bolsee, C. Hermans, U. Kroth, C. Laubis, V. Mortet, J.C. de Jaeger, B. Giordanengo, M. Richter, F. Scholze, J.F. Hochedez, Diamond Rel. Mater. 18, 860 (2009)
D.K. Schroder, Int. J. High Speed Electron. Syst. 21, 1250009 (2012)
D.K. Ferry, Phys. Rev. B 12, 2361 (1975)
M. Wraback, H. Shen, J.C. Carrano, T. Li, J.C. Campbell, M.J. Schurman, I.T. Ferguson, Appl. Phys. Lett. 76, 1155 (2000)
M. Wraback, H. Shen, J.C. Carrano, C.J. Collins, J.C. Campbell, R.D. Dupuis, M.J. Schurman, I.T. Ferguson, Appl. Phys. Lett. 79, 1303 (2001)
M. Wraback, H. Shen, S. Rudin, Proc. SPIE 4646, 117 (2002)
S. Adachi, Properties of Group-IV, III–V and II–VI Semiconductors (Wiley, Chichester, 2005)
M.E. Levinshtein, S.L. Rumyantsev, M.S. Shur (eds.), Properties of Advanced Semiconductor Materials: GaN, AlN, InN, BN, SiC, SiGe (Wiley, New York, 2001)
E.O. Johnson, Proc. IEEE Int. Conv. Record 13, 27 (1965)
E.O. Johnson, RCA Rev. 26, 163 (1965)
R.W. Keyes, Proc. IEEE 60, 225 (1972)
J.L. Hudgins, G.S. Simin, E. Santi, M.A. Khan, IEEE Trans. Power Electron. 18, 907 (2003)
L.-M. Wang, in Proceedings of IEEE 25th International Conference on Microelectron. (2006), p. 615
D. Shaddock, L. Meyer, J. Tucker, S. Dasgupta, R. Fillion, P. Bronecke, L. Yorinks, P. Kraft, in Proceedings of 19th IEEE Semiconductor Thermal Symposium (2003), p. 42
H. Jain, S. Rajawat, P. Agrawal, Proceedings of International Conference on Microelectron. 2008 (2008), p. 878
S. Strite, H. Morkoç, J. Vac. Sci. Technol. B 10, 1237 (1992)
H. Morkoç, S. Strite, G.B. Gao, M.E. Lin, B. Sverdlov, M. Burns, J. Appl. Phys. 76, 1363 (1994)
S.N. Mohammad, A.A. Salvador, H. Morkoç, Proc. IEEE 83, 1306 (1995)
S.N. Mohammad, H. Morkoç, Prog. Quantum Electron. 20, 361 (1996)
S.J. Pearton, J.C. Zolper, R.J. Shul, F. Ren, J. Appl. Phys. 86, 1 (1999)
F. Ren, J.C. Zolper (eds.), Wide Energy Bandgap Electronic Devices (World Scientific, River Edge, 2003)
M.S. Shur, R.F. Davis (eds.), GaN-based Materials and Devices: Growth, Fabrication, Characterization and Performance (World Scientific, River Edge, 2004)
C. Liu, F. Yun, H. Morkoç, J. Mater. Sci.: Mater. Electron. 16, 555 (2005)
Ü. Özgür, Ya. I. Alivov, C. Liu, A. Teke, M.A. Reshchikov, S. Doğan, V. Avrutin, S.-J. Cho, H. Morkoç, J. Appl. Phys. 98, 041301 (2005)
A. Ashrafi, C. Jagadish, J. Appl. Phys. 102, 071101 (2007)
M. Bockowski, Cryst. Res. Technol. 42, 1162 (2007)
R. Brazis, R. Raguotis, Phys. Status Solidi C 6, 2674 (2009)
R.P. Davies, C.R. Abernathy, S.J. Pearton, D.P. Norton, M.P. Ivill, F. Ren, Chem. Eng. Commun. 196, 1030 (2009)
J.A. del Alamo, J. Joh, Micro. Reliability 49, 1200 (2009)
H. Morkoç, Ü. Özgür, Zinc Oxide: Fundamentals, Materials and Device Technology (Wiley, Weinheim, 2009)
Y.-S. Choi, J.-W. Kang, D.-K. Hwang, S.-J. Park, IEEE Trans. Electron Devices 57, 26 (2010)
A. Katz, M. Franco, IEEE Micro. Mag. 11, S24 (2010)
H. Morkoç, Proc. IEEE 98, 1113 (2010)
Ü. Özgür, D. Hofstetter, H. Morkoç, Proc. IEEE 98, 1255 (2010)
S.J. Pearton, C.R. Abernathy, F. Ren, Gallium Nitride Processing for Electronics, Sensors and Spintronics (Springer, New York, 2010)
M. Razeghi, IEEE Photon. J. 3, 263 (2011)
R.S. Pengelly, S.M. Wood, J.W. Milligan, S.T. Sheppard, W.L. Pribble, IEEE Trans. Micro. Theor. Tech. 60, 1764 (2012)
Y. Hao, J. Zhang, B. Shen, X. Liu, J. Semicond. 33, 081001 (2012)
F. Scholz, Semicond. Sci. Tech. 27, 024002 (2012)
B.J. Baliga, Semicond. Sci. Tech. 28, 074011 (2013)
S. Colangeli, A. Bentini, W. Chiccognani, E. Limiti, A. Nanni, IEEE Trans. Electron Devices 60, 3238 (2013)
T. Kachi, Electron. Express 10, 1 (2013)
S. Nakamura, M.R. Krames, Proc. IEEE 101, 2211 (2013)
S.J. Pearton, R. Deist, F. Ren, L. Liu, A.Y. Polyakov, J. Kim, J. Vac. Sci. Technol. A 31, 050801 (2013)
D.W. Runton, B. Trabert, J.B. Shealy, R. Vetury, IEEE Micro. Mag. 14, 82 (2013)
J. Millán, P. Godignon, X. Perpiñà, A. Pérez-Tomás, J. Rebollo, IEEE Trans. Power Electron. 29, 2155 (2014)
H.P. Maruska, J.J. Tietjen, Appl. Phys. Lett. 15, 327 (1969)
D. Visalli, M. Van Hove, P. Srivastava, J. Derluyn, J. Das, M. Leys, S. Degroote, K. Cheng, M. Germain, G. Borghs, Appl. Phys. Lett. 97, 113501 (2010)
I.B. Rowena, S.L. Selvaraj, T. Egawa, IEEE Electron Dev. Lett. 32, 1534 (2011)
B.A. Danilchenko, I.A. Obukhov, T. Paszkiewicz, S. Wolski, A. Jeżowski, Solid State Commun. 144, 114 (2007)
K. Jagannadham, E.A. Berkman, N. Elmasry, J. Vac. Sci. Technol. A 26, 375 (2008)
B.E. Foutz, S.K. O’Leary, M.S. Shur, L.F. Eastman, J. Appl. Phys. 85, 7727 (1999)
S.K. O’Leary, B.E. Foutz, M.S. Shur, L.F. Eastman, Solid State Commun. 118, 79 (2001)
S.K. O’Leary, B.E. Foutz, M.S. Shur, L.F. Eastman, J. Electron. Mater. 32, 327 (2003)
S.K. O’Leary, B.E. Foutz, M.S. Shur, L.F. Eastman, J. Mater. Sci.: Mater. Electron. 17, 87 (2006)
S. Nakamura, Mater. Res. Soc. Bull. 22, 29 (1997)
M.S. Shur, M.A. Khan, Mater. Res. Soc. Bull. 22, 44 (1997)
A.A. Burk Jr., M.J. O’Loughlin, R.R. Siergiej, A.K. Agarwal, S. Sriram, R.C. Clarke, M.F. MacMillan, V. Balakrishna, C.D. Brandt, Solid State Electron. 43, 1459 (1999)
S. Nakamura, S.F. Chichibu (eds.), Introduction to Nitride Semiconductor Blue Lasers and Light Emitting Diodes (Taylor and Francis, New York, 2000)
M.A. Khan, J.W. Yang, W. Knap, E. Frayssinet, X. Hu, G. Simin, P. Prystawko, M. Leszczynski, I. Grzegory, S. Porowski, R. Gaska, M.S. Shur, B. Beaumont, M. Teisseire, G. Neu, Appl. Phys. Lett. 76, 3807 (2000)
S. Nakamura, S. Pearton, G. Fasol, The Blue Laser Diode: The Complete Story (Springer, New York, 2000)
M. Umeno, T. Egawa, H. Ishikawa, Mater. Sci. Semicond. Process. 4, 459 (2001)
A. Krost, A. Dadgar, Phys. Status Solidi A 194, 361 (2002)
A. Z̆ukauskas, M.S. Shur, R. Gaska, Introduction to Solid–State Lighting (Wiley, New York, 2002)
X. Hu, J. Deng, N. Pala, R. Gaska, M.S. Shur, C.Q. Chen, J. Yang, G. Simin, M.A. Khan, J.C. Rojo, L.J. Schowalter, Appl. Phys. Lett. 82, 1299 (2003)
A. Jiménez, Z. Bougrioua, J.M. Tirado, A.F. Braña, E. Calleja, E. Muñoz, I. Moerman, Appl. Phys. Lett. 82, 4827 (2003)
W. Lu, V. Kumar, E.L. Piner, I. Adesida, IEEE Trans. Electron Devices 50, 1069 (2003)
C.L. Tseng, M.J. Youh, G.P. Moore, M.A. Hopkins, R. Stevens, W.N. Wang, Appl. Phys. Lett. 83, 3677 (2003)
J.C. Carrano, A. Z̆ukauskas (eds.), Optically Based Biological and Chemical Sensing for Defense (SPIE, Bellingham, 2004)
M.S. Shur, A. Z̆ukauskas (eds.), UV Solid–State Light Emitters and Detectors (Kluwer, Boston, 2004)
M. Shur, M. Shatalov, A. Dobrinsky, R. Gaska, Advances in GaN and ZnO-based Thin Film, Bulk, and Nanostructured Materials and Devices, in Materials and Devices Series in Materials Science, ed. by S. Pearton (Springer, Berlin, 2012), pp. 83–120
D.H. Levy, S.F. Nelson, J. Vac. Sci. Technol. A 30, 018501 (2012)
H. Liu, V. Avrutin, N. Izyumskaya, Ü. Özgür, H. Moroç, Super. Micro. 48, 458 (2010)
C.-K. Yang, K.S. Dy, Solid State Commun. 88, 491 (1993)
J.D. Albrecht, P.P. Ruden, S. Limpijumnong, W.R.L. Lambrecht, K.F. Brennan, J. Appl. Phys. 86, 6864 (1999)
J.F. Muth, R.M. Kolbas, A.K. Sharma, S. Oktyabrsky, J. Narayan, J. Appl. Phys. 85, 7884 (1999)
M.A. Littlejohn, J.R. Hauser, T.H. Glisson, Appl. Phys. Lett. 26, 625 (1975)
B. Gelmont, K. Kim, M. Shur, J. Appl. Phys. 74, 1818 (1993)
V.W.L. Chin, T.L. Tansley, T. Osotchan, J. Appl. Phys. 75, 7365 (1994)
J. Kolník, İ.H. Oğuzman, K.F. Brennan, R. Wang, P.P. Ruden, Y. Wang, J. Appl. Phys. 78, 1033 (1995)
N.S. Mansour, K.W. Kim, M.A. Littlejohn, J. Appl. Phys. 77, 2834 (1995)
M. Shur, B. Gelmont, M.A. Khan, J. Electron. Mater. 25, 777 (1996)
U.V. Bhapkar, M.S. Shur, J. Appl. Phys. 82, 1649 (1997)
E.G. Brazel, M.A. Chin, V. Narayanamurti, D. Kapolnek, E.J. Tarsa, S.P. DenBaars, Appl. Phys. Lett. 70, 330 (1997)
B.E. Foutz, L.F. Eastman, U.V. Bhapkar, M.S. Shur, Appl. Phys. Lett. 70, 2849 (1997)
J.D. Albrecht, R.P. Wang, P.P. Ruden, M. Farahmand, K.F. Brennan, J. Appl. Phys. 83, 1446 (1998)
J.D. Albrecht, R.P. Wang, P.P. Ruden, M. Farahmand, K.F. Brennan, J. Appl. Phys. 83, 4777 (1998)
J.D. Albrecht, R. Wang, P.P. Ruden, M. Farahmand, E. Bellotti, K.F. Brennan, Mater. Res. Symp. Proc. 482, 815 (1998)
M.S. Krishnan, N. Goldsman, A. Christou, J. Appl. Phys. 83, 5896 (1998)
D.C. Look, D.C. Reynolds, J.R. Sizelove, R.L. Jones, C.W. Litton, G. Cantwell, W.C. Harsch, Solid State Commun. 105, 399 (1998)
R. Oberhuber, G. Zandler, P. Vogl, Appl. Phys. Lett. 73, 818 (1998)
S.K. O’Leary, B.E. Foutz, M.S. Shur, U.V. Bhapkar, L.F. Eastman, J. Appl. Phys. 83, 826 (1998)
S.K. O’Leary, B.E. Foutz, M.S. Shur, U.V. Bhapkar, L.F. Eastman, Solid State Commun. 105, 621 (1998)
N.G. Weimann, L.F. Eastman, D. Doppalapudi, H.M. Ng, T.D. Moustakas, J. Appl. Phys. 83, 3656 (1998)
N.A. Zakhleniuk, C.R. Bennett, B.K. Ridley, M. Babiker, Appl. Phys. Lett. 73, 2485 (1998)
B.E. Foutz, S.K. O’Leary, M.S. Shur, L.F. Eastman, Mater. Res. Symp. Proc. 572, 445 (1999)
N. Balkan, M.C. Arikan, S. Gokden, V. Tilak, B. Schaff, R.J. Shealy, J. Phys: Condens. Matt. 14, 3457 (2002)
S. Gokden, N. Balkan, B.K. Ridley, Semicond. Sci. Technol. 18, 206 (2003)
S. Gökden, Phys. E 23, 198 (2004)
B.K. Ridley, W.J. Schaff, L.F. Eastman, J. Appl. Phys. 96, 1499 (2004)
B. Benbakhti, M. Rousseau, A. Soltani, J.-C. de Jaeger, IEEE Trans. Electron Devices 53, 2237 (2006)
B. Guo, U. Ravaioli, M. Staedele, Comp. Phys. Commun. 175, 482 (2006)
S. Kabra, H. Kaur, S. Haldar, M. Gupta, R.S. Gupta, Phys. Status Solidi C 3, 2350 (2006)
C.H. Oxley, M.J. Uren, A. Coates, D.G. Hayes, IEEE Trans. Electron Devices 53, 565 (2006)
F. Bertazzi, M. Goano, E. Bellotti, J. Electron. Mater. 36, 857 (2007)
J. Khurgin, Y.J. Ding, D. Jena, Appl. Phys. Lett. 91, 252104 (2007)
M. Ramonas, A. Matulionis, L.F. Eastman, Semicond. Sci. Technol. 22, 875 (2007)
Y. Tomita, H. Ikegami, H.I. Fujishiro, Phys. Status Solidi C 4, 2695 (2007)
S. Yamakawa, M. Saraniti, S.M. Goodnick, Proc. SPIE 6471, 64710M (2007)
Z. Yarar, J. Electron. Mater. 40, 466 (2011)
E. Furno, F. Bertazzi, M. Goano, G. Ghione, E. Bellotti, Solid State Electron. 52, 1796 (2008)
A. Matulionis, J. Liberis, E. S̆ermuks̆nis, J. Xie, J.H. Leach, M. Wu, H. Morkoç, Semicond. Sci. Technol. 23, 075048 (2008)
F. Betazzi, E. Bellotti, E. Furno, M. Goano, J. Electron. Mater. 38, 1677 (2009)
A. Hamdoune, N.-E.C. Sari, Phys. Procedia 2, 905 (2009)
H. Arabshahi, M.R. Rokn-Abadi, F.B. Bagh-Siyahi, Res. J. Appl. Sci. 5, 215 (2010)
F. Bertazzi, M. Penna, M. Goano, E . Bellotti, Proc. SPIE 7603, 760303 (2010)
S.K. O’Leary, B.E. Foutz, M.S. Shur, L.F. Eastman, Solid State Commun. 150, 2182 (2010)
W.A. Hadi, S.K. O’Leary, M.S. Shur, L.F. Eastman, Solid State Commun. 151, 874 (2011)
W.A. Hadi, M.S. Shur, S.K. O’Leary, J. Appl. Phys. 112, 033720 (2012)
W.A. Hadi, S. Chowdhury, M.S. Shur, S.K. O’Leary, J. Appl. Phys. 112, 123722 (2012)
E. Baghani, S.K. O’Leary, J. Appl. Phys. 114, 023703 (2013)
W.A. Hadi, M.S. Shur, S.K. O’Leary, J. Mater. Sci.: Mater. Electron. 24, 2 (2013)
S. Shishehchi, F. Bertazzi, E. Bellotti, Proc. SPIE 8619, 86190H (2013)
J.H. Buß, J. Rudolph, T. Schupp, D.J. As, K. Lischka, D. Hägele, Appl. Phys. Lett. 97, 062101 (2010)
A.W. Wood, R.R. Collino, B.L. Cardozo, F. Naab, Y.Q. Wang, R.S. Goldman, J. Appl. Phys. 110, 124307 (2011)
B.R. Nag, Electron Transport in Compound Semiconductors (Springer, Berlin, 1980)
M. Shur, Physics of Semiconductor Devices (Prentice-Hall, Englewood Cliffs, 1990)
U.K. Mishra, J. Singh, Semiconductor Device Physics and Design (Springer, Dordrecht, 2008)
N.W. Ashcroft, N.D. Mermin, Solid State Physics (Saunders College, Philadelphia, 1976)
C. Kittel, Introduction to Solid–State Physics, 8th edn. (Wiley, New York, 2005)
D.C. Look, J.R. Sizelove, S. Keller, Y.F. Wu, U.K. Mishra, S.P. DenBaars, Solid State Commun. 102, 297 (1997)
E.M. Conwell, M.O. Vassell, IEEE Trans. Electron Devices 13, 22 (1966)
P.A. Sandborn, A. Rao, P.A. Blakey, IEEE Trans. Electron Devices 36, 1244 (1989)
D.K. Ferry, C. Jacoboni (eds.), Quantum Transport in Semiconductors (Plenum Press, New York, 1992)
A. Papoulis, Probability, Random Variables, and Stochastic Processes, 3rd edn. (McGraw-Hill, New York, 1991)
R.M. Yorston, J. Comput. Phys. 64, 177 (1986)
W. Fawcett, A.D. Boardman, S. Swain, J. Phys. Chem. Solids 31, 1963 (1970)
B.K. Ridley, Quantum Processes in Semiconductors, 3rd edn. (Oxford, New York, 1993)
C. Jacoboni, L. Reggiani, Rev. Mod. Phys. 55, 645 (1983)
C. Jacoboni, P. Lugli, The Monte Carlo Method for Semiconductor Device Simulation (Springer, New York, 1989)
G.U. Jensen, B. Lund, T.A. Fjeldly, M. Shur, Comp. Phys. Commun. 67, 1 (1991)
A. Bykhovski, B. Gelmont, M. Shur, A. Khan, J. Appl. Phys. 77, 1616 (1995)
A.D. Bykhovski, V.V. Kaminski, M.S. Shur, Q.C. Chen, M.A. Khan, Appl. Phys. Lett. 68, 818 (1996)
M.A. Littlejohn, J.R. Hauser, T.H. Glisson, J. Appl. Phys. 48, 4587 (1977)
W.R.L. Lambrecht, B. Segall, in Properties of Group III Nitrides, No. 11 EMIS Datareviews Series, ed. by J. H. Edgar (Inspec, London, 1994), Chapter 4
J.S. Blakemore, J. Appl. Phys. 53, R123 (1982)
S.M. Sze, K.K. Ng, Physics of Semiconductor Devices (Wiley, Hoboken, 2007)
P. Lugli, D.K. Ferry, IEEE Trans. Electron Devices 32, 2431 (1985)
K. Seeger, Semiconductor Physics: An Introduction, 9th edn. (Springer, Berlin, 2004)
B.E. Foutz, S.K. O’Leary, M.S. Shur, L.F. Eastman, U.V. Bhapkar, Mater. Res. Soc. Symp. Proc. 482, 821 (1998)
S.K. O’Leary, B.E. Foutz, M.S. Shur, L.F. Eastman, U.V. Bhapkar, Mater. Res. Soc. Symp. Proc. 482, 845 (1998)
B.E. Foutz, S.K. O’Leary, M.S. Shur, L.F. Eastman, Mater. Res. Soc. Symp. Proc. 512, 555 (1998)
S.K. O’Leary, B.E. Foutz, M.S. Shur, L.F. Eastman, Appl. Phys. Lett. 87, 222103 (2005)
S.K. O’Leary, B.E. Foutz, M.S. Shur, L.F. Eastman, Appl. Phys. Lett. 88, 152113 (2006)
W.A. Hadi, R. Cheekoori, M.S. Shur, S.K. O’Leary, J. Mater. Sci.: Mater. Electron. 24, 807 (2013)
W.A. Hadi, M.S. Shur, S.K. O’Leary, J. Mater. Sci.: Mater. Electron. 24, 1624 (2013)
W.A. Hadi, P.K. Guram, M.S. Shur, S.K. O’Leary, J. Appl. Phys. 113, 113709 (2013)
J.G. Ruch, IEEE Trans. Electron Devices 19, 652 (1972)
M.S. Shur, L.F. Eastman, IEEE Trans. Electron Devices 26, 1677 (1979)
M. Heiblum, M.I. Nathan, D.C. Thomas, C.M. Knoedler, Phys. Rev. Lett. 55, 2200 (1985)
A. Palevski, M. Heiblum, C.P. Umbach, C.M. Knoedler, A.N. Broers, R.H. Koch, Phys. Rev. Lett. 62, 1776 (1989)
A. Palevski, C.P. Umbach, M. Heiblum, Appl. Phys. Lett. 55, 1421 (1989)
A. Yacoby, U. Sivan, C.P. Umbach, J.M. Hong, Phys. Rev. Lett. 66, 1938 (1991)
G.S. Parks, C.E. Hablutzel, L.E. Webster, J. Am. Chem. Soc. 49, 2792 (1927)
E. Tiede, M. Thimann, K. Sensse, Chem. Berichte 61, 1568 (1928)
W.C. Johnson, J.B. Parsons, M.C. Crew, J. Phys. Chem. 36, 2651 (1932)
G.I. Finch, H. Wilman, J. Chem. Soc. 751 (1934).
V.E. Cosslett, Nature 136, 988 (1935)
R. Juza, H. Hahn, Zeitschr. Anorgan. Allgem. Chem. 239, 282 (1938)
M.A. Khan, Q. Chen, C.J. Sun, M. Shur, B. Gelmont, Appl. Phys. Lett. 67, 1429 (1995)
S. Yoshida, S. Misawa, S. Gonda, J. Vac. Sci. Technol. B 1, 250 (1983)
H. Nakayama, P. Hacke, M.R.H. Khan, T. Detchprohm, K. Hiramatsu, N. Sawaki, Jpn. J. Appl. Phys. 35, L282 (1996)
C.A. Hurni, J.R. Lang, P.G. Burke, J.S. Speck, Appl. Phys. Lett. 101, 102106 (2012)
Z.C. Huang, R. Goldberg, J.C. Chen, Y. Zheng, D.B. Mott, P. Shu, Appl. Phys. Lett. 67, 2825 (1995)
S. Krishnamurthy, M. van Schilfgaarde, A. Sher, A.-B. Chen, Appl. Phys. Lett. 71, 1999 (1997)
A. Matulionis, J. Liberis, L. Ardaravičius, M. Ramonas, I. Matulionienė, J. Smart, Semicond. Sci. Technol. 17, L9 (2002)
C. Bulutay, B.K. Ridley, N.A. Zakhleniuk, Phys. Rev. B 68, 115205 (2003)
R. Brazis, R. Raguotis, Appl. Phys. Lett. 85, 609 (2004)
A.A.P. Silva, V.A. Nascimento, J. Lumin. 106, 253 (2004)
C.E. Martinez, N.M. Stanton, A.J. Kent, M.L. Williams, I. Harrison, H. Tang, J.B. Webb, J.A. Bardwell, Semicond. Sci. Technol. 21, 1580 (2006)
M. Tas, B. Tanatar, Phys. Status Solidi C 4, 372 (2007)
A. Matulionis, J. Liberis, E. S̆ermuks̆nis, J. Xie, J.H. Leach, M. Wu, H. Morkoç, Semicond. Sci. Technol. 23, 075048 (2008)
A. Matulionis, J. Liberis, IEE Proc. Circ. Dev. Syst 151, 148 (2004)
M. Ramonas, A. Matulionis, J. Liberis, L. Eastman, X. Chen, Y.-J. Sun, Phys. Rev. B 71, 075324 (2005)
J.M. Barker, D.K. Ferry, S.M. Goodnick, D.D. Koleske, A. Allerman, R.J. Shul, Phys. Status Solidi C 2, 2564 (2005)
L. Ardaravičius, M. Ramonas, O. Kiprijanovic, J. Liberis, A. Matulionis, L.F. Eastman, J.R. Shealy, X. Chen, Y.J. Sun, Phys. Status Solidi A 202, 808 (2005)
Y. Chang, K.Y. Tong, C. Surya, Semicond. Sci. Technol. 20, 188 (2005)
S. Yamakawa, S.M. Goodnick, J. Branlard, M. Saraniti, Phys. Status Solidi C 2, 2573 (2005)
A. Reklaitis, L. Reggiani, J. Appl. Phys. 97, 043709 (2005)
L.F. Eastman, V. Tilak, J. Smart, B.M. Green, E.M. Chumbes, R. Dimitrov, H. Kim, O.S. Ambacher, N. Weimann, T. Prunty, M. Murphy, W.J. Schaff, J.R. Shealy, IEEE Trans. Electron Devices 48, 479 (2001)
C.H. Oxley, M.J. Uren, IEEE Trans. Electron Devices 52, 165 (2005)
A. Ilgaz, S. Gökden, R. Tülek, A. Teke, S. Özçelik, E. Özbay, Eur. Phys. J. Appl. Phys. 55, 30102 (2011)
D.R. Naylor, A. Dyson, B.K. Ridley, Solid State Commun. 152, 549 (2012)
D.R. Naylor, A. Dyson, B.K. Ridley, J. Appl. Phys. 111, 053703 (2012)
E. Bellotti, F. Bertazzi, S. Shishehchi, M. Matsubara, M. Goano, IEEE Trans. Electron Devices 60, 3204 (2013)
S. Dasgupta, J. Lu, Nidhi, A. Raman, C. Hurni, G. Gupta, J.S. Speck, U.K. Mishra, Appl. Phys. Express 6, 034002 (2013)
J.-Z. Zhang, A. Dyson, B.K. Ridley, Appl. Phys. Lett. 102, 062104 (2013)
W.A. Hadi, M. Shur, L.F. Eastman, S.K. O’Leary, Mater. Res. Soc. Symp. Proc. 1327 (2011) doi:10.1557/opl.2011.851
W.A. Hadi, M.S. Shur, S.K. O’Leary, Mater. Res. Soc. Symp. Proc. 1577 (2013). doi:10.1557/opl.2013.535
W.A. Hadi, M.S. Shur, S.K. O’Leary, Mater. Res. Soc. Symp. Proc. 1577 (2013). doi:10.1557/opl.2013.534
W.A. Hadi, E. Baghani, M.S. Shur, S.K. O’Leary, Mater. Res. Soc. Symp. Proc. 1577 (2013). doi:10.1557/opl.2013.649
W. A. Hadi, E. Baghani, M.S. Shur, S.K. O’Leary, Mater. Res. Soc. Symp. Proc. 1674 (2014). doi:10.1557/opl.2014.479
Acknowledgments
Financial support from the Natural Sciences and Engineering Research Council of Canada is gratefully acknowledged. The work performed at Rensselaer Polytechnic Institute was supported by the Army Research Laboratory under the auspices of the ARL MSME Alliance program.
Author information
Authors and Affiliations
Corresponding author
Additional information
This paper is dedicated to the memory of our friend, mentor, and co-author, Professor Lester F. Eastman, of Cornell University, who passed away in 2013.
Note to Reader Some of the results presented herein, and portions of the text, are borrowed from our previous review article; see O’Leary et al. [62]. This overlap in results and text is meant to make this particular review article as self-contained and complete as possible.
Rights and permissions
About this article
Cite this article
Hadi, W.A., Shur, M.S. & O’Leary, S.K. Steady-state and transient electron transport within the wide energy gap compound semiconductors gallium nitride and zinc oxide: an updated and critical review. J Mater Sci: Mater Electron 25, 4675–4713 (2014). https://doi.org/10.1007/s10854-014-2226-2
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s10854-014-2226-2