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Crystalline quality and phase purity of CVD diamond films studied by Raman spectroscopy

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Abstract

Two series of diamond films grown—at different temperatures—by two chemical vapor deposition (CVD) methods, i.e., hot filament (HFCVD) and microwave-plasma (MPCVD), were investigated. Raman spectroscopy and scanning electron microscopy were employed to perform a study of both crystalline quality and phase purity of the films grown by the two techniques. It was found that high phase purity can be attained by both methods. However, at high temperatures, the MPCVD technique produced films with higher crystalline quality as compared to those grown by HFCVD. Finally, in order to shed some light into the mechanisms responsible for the lower crystalline quality observed in the HFCVD films, a study based in the phonon confinement model and stress was accomplished.

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Acknowledgements

The author (W.F) would like to thank Dr. Paulo Sergio Pizani for useful discussions. This work was partially supported by the Brazilian agencies, CAPES, CNPq and FAPESP.

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Authors and Affiliations

  1. Lab de Semicondutores, Departamento de Física, Universidade Federal de São Carlos, CP 676, São Carlos, 13565-905, Brazil

    W. Fortunato, A. J. Chiquito & J. C. Galzerani

  2. Lab de Diamantes, Universidade São Francisco, Itatiba, 13231-900, Brazil

    J. R. Moro

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  1. W. Fortunato
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  2. A. J. Chiquito
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  3. J. C. Galzerani
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  4. J. R. Moro
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Correspondence to W. Fortunato.

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Fortunato, W., Chiquito, A.J., Galzerani, J.C. et al. Crystalline quality and phase purity of CVD diamond films studied by Raman spectroscopy. J Mater Sci 42, 7331–7336 (2007). https://doi.org/10.1007/s10853-007-1575-0

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  • DOI: https://doi.org/10.1007/s10853-007-1575-0

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