Abstract
The microstructural and electrochemical properties of rf-sputtered LiMn2O4 films were investigated as a function of post-deposition process. The degree of crystallization in the films gradually increased with the increase of annealing temperature (T a). The films annealed at T a = 973 K exhibited characteristic peaks with predominant (111) orientation representing the cubic spinel structure of Fd3m symmetry. The estimated Mn–Mn and Mn–O distances obtained from the X-ray diffraction data were observed to be increased slightly with T a. Characteristic changes in surface morphological features were observed as a function of T a as evidenced from scanning electron microscopy. The estimated root mean square (RMS) roughness of the films increased from 97 to 161 nm with augmentation of T a. The electrochemical studies, viz. cyclic voltammetry (CV), specific discharge capacity and Li ion diffusion coefficient were carried out for annealed LiMn2O4 films in saturated aqueous electrolyte (Li2SO4) in the potential window of 0–1.2 V and correlated with surface morphology and grain size. The LiMn2O4 films annealed at T a = 973 K exhibited better electrochemical performance and demonstrated a discharge capacity of about 53.5 μA h cm−2 μm−1 with diffusion coefficient of 1.2 × 10−13 cm2 s−1.
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Acknowledgements
Dr. O.M. Hussain thanks the DRDO, Hyderabad, India, for providing financial support to this study.
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Jayanth-Babu, K., Jeevan-Kumar, P., Hussain, O.M. et al. Influence of annealing temperature on microstructural and electrochemical properties of rf-sputtered LiMn2O4 film cathodes. J Solid State Electrochem 16, 3383–3390 (2012). https://doi.org/10.1007/s10008-012-1784-6
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DOI: https://doi.org/10.1007/s10008-012-1784-6