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Structural and electrical properties of lithium manganese oxide thin films grown by pulsed laser deposition

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Abstract

LiMn2O4 thin films were deposited by reactive pulsed laser deposition technique and studied the microstructural and electrical properties of the films. The LiMn2O4 thin films deposited in an oxygen partial pressure of 100 mTorr and at a substrate temperature of 573 K from a lithium rich target were found to be nearly stoichiometric. The films exhibited predominantly (111) orientation representing the cubic spinel structure with Fd3m symmetry. The intensity of (111) peak increased and a slight shift in the peak position was observed with the increase of substrate temperature. The lattice parameter increased from 8.117 to 8.2417 Å with the increase of substrate temperature from 573 to 873 K. The electrical conductivity of the films is observed to be a strong function of temperature. The evaluated activation energy for the films deposited at 873 K is 0.64 eV.

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Authors and Affiliations

  1. Thin Film Laboratory, Department of Physics, Sri Venkateswara University, Tirupati, 517 502, India

    O. M. Hussain, K. Hari Krishna & V. Kalai Vani

  2. Institut des Nano-Sciences de Paris (INSP), Université Pierre et Marie Curie CNRS-UMR 7588, Campus Boucicaut, 140 rue de Lourmel, 75015, Paris, France

    C. M. Julien

Authors
  1. O. M. Hussain
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  2. K. Hari Krishna
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  3. V. Kalai Vani
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  4. C. M. Julien
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Correspondence to O. M. Hussain.

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Hussain, O.M., Hari Krishna, K., Kalai Vani, V. et al. Structural and electrical properties of lithium manganese oxide thin films grown by pulsed laser deposition. Ionics 13, 455–459 (2007). https://doi.org/10.1007/s11581-007-0134-7

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  • DOI: https://doi.org/10.1007/s11581-007-0134-7

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