Abstract
Current transients and mass variations in as-prepared and heat-treated anodic alumina films were measured during re-anodizing by means of voltammetry and electrochemical quartz crystal microbalance (EQCM), respectively. Aluminum electrodes (100 nm) on quartz crystals were prepared by thermal evaporation. Anodic alumina films were formed on the surface of Al electrodes in aqueous solutions of oxalic (0.3 M) and phosphoric (0.6 M) acid in the potentiostatic regime. The EQCM experiments did not detect an overshoot in the mass variation of the Al electrode during re-anodizing of heat-treated anodic alumina films. The observed current overshoot in transients proved the presence of electrons and electron holes injected from the contacts in the bulk of the oxide. This can be explained by the emergence of excess electrons in the barrier layer of the alumina films due to a change in the mobility of the electrons.
Similar content being viewed by others
References
Diggle JW, Downie TC, Goulding CW (1969) Chem Rev 69:365–405
Patermarakis G (2009) J Electroanal Chem 635:39–50
Patermarakis G, Moussoutzanis K, Chandrinos J (2001) J Solid State Electrochem 6:39–54
Patermarakis G, Chandrinos J, Masavetas K (2007) J Solid State Electrochem 11:1191–1204
Thompson GE, Xu Y, Skeldon P, Shimizu K, Han SH, Wood GC (1987) Phil Mag B55:651–667
Dignam MJ (1972) In: Diggle JW (ed) Oxides and oxide films 1. New York, Marcel Dekker
Bean CP, Fisher JC, Vermilyea DA (1956) Phys Rev 101:551–554
Young L, Smith DJ (1979) J Electrochem Soc 126:765–768
De Wit HJ, Wijenberg C, Crevecoeur C (1979) J Electrochem Soc 126:779–785
Vrublevsky I, Jagminas A, Schreckenbach J, Goedel WA (2008) Solid State Sci 10:1605–1611
Ikonopisov S (1977) Electrochim Acta 22:1077–1082
Albella JM, Montero I, Martinez-Duart JM (1987) Electrochim Acta 32:255–258
Patermarakis G, Karayianni H, Masavetas K, Chandrinos J (2009) J Solid State Electrochem 13:1831–1847
Patermarakis G, Moussoutzanis K, Nikolopoulos N (1999) J Solid State Electrochem 3:193–204
Patermarakis G (2006) J Solid State Electrochem 10:211–222
Zhu XF, Li DD, Song Y, Xiao YH (2005) Matter Lett 59:3160–3163
Shimizu K, Habazaki H, Skeldon P (2002) Electrochim Acta 47:1225–1228
Zhuravlyova E, Iglesias-Rubianes L, Pakes A, Skeldon P, Thompson GE, Zhou X, Quance T, Graham MJ, Habazaki H, Shimizu K (2002) Corros Sci 44:2153–2159
Lambert J, Guthmann C, Ortega C, Saint-Jean M (2002) Appl Phys 91:9161–9169
Lyuksyutov SF, Paramonov PB, Dolog I, Ralich RM (2003) Nanotechnol 14:716–721
Munoz Ramo D, Shluger AL, Gavartin JL, Bersuker G (2007) Phys Rev Lett 99:155504
Lohrengel MM (1993) Mater Sci Eng R11:243–294
Bund A, Schwitzgebel G (2000) Electrochim Acta 45:3703–3710
Bund A, Schneider O, Dehnke V (2002) Phys Chem Chem Phys 4:3552–3554
Bund A, Neudeck S (2004) J Phys Chem B108:17845–17850
Sauerbrey G (1959) Z Phys 155:206–222
Kanazawa KK, Gordon JG II (1985) Anal Chim Acta 175:99–105
Goubaidoulline I, Reuber J, Merz F, Johannsmann D (2005) J Appl Phys 98:014305
Schoen P, Michalek R, Walder L (1999) Anal Chem 71:3305–3310
Vrublevsky I, Jagminas A, Schreckenbach J, Goedel WA (2007) Electrochim Acta 53:300–304
Vrublevsky I, Parkoun V, Schreckenbach J, Goedel WA (2006) Appl Surf Sci 252:5100–5108
Bund A, Schneider M (2002) J Electrochem Soc 149:E331–E339
Naoi K, Oura Y, Ue M (1997) Denki Kagaku 65:1066–1069
Young L (1961) Anodic oxide films. Academic, London
Shimizu K, Thompson GE, Wood GC (1981) Thin Solid Films 81:39–44
Ikonopisov S, Andreeva L, Vodenicharov C (1970) Electrochim Acta 15:421–429
Chao CY, Lin LF, Macdonald DD (1981) J Electrochem Soc 128:1187–1194
Lin LF, Chao CY, Macdonald DD (1981) J Electrochem Soc 128:1194–1198
Macdonald DD, Urquidi-Macdonald M (1990) J Electrochem Soc 137:2395–2402
Maissel L (1970) In: Maissel L, Glang R (eds) Handbook of thin film technology. New York, McGraw-Hill
Belca I, Kasalica B (1999) Zekovic Lj, Jovanic B, Vasilic R. Electochim Acta 45:993–996
Stojadinovic S, Tadic M, Belca I, Kasalica B, Zekovic LJ (2007) Electrochim Acta 52:7166–7170
Stojadinovic S, Belca I, Kasalica B, Zekovic LJ, Tadic M (2006) Electrochem Commun 8:1621–1624
Zhang X, Devine TM (2006) J Electrochem Soc 153:B344–B351
Acknowledgements
The authors are grateful to the Deutsche Forschungsgemeinschaft (Germany) within the Grant BU 1200/16-1 for the financial support of this work.
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Ispas, A., Bund, A. & Vrublevsky, I. Investigations on current transients in porous alumina films during re-anodizing using the electrochemical quartz crystal microbalance. J Solid State Electrochem 14, 2121–2128 (2010). https://doi.org/10.1007/s10008-010-1043-7
Received:
Revised:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s10008-010-1043-7