Abstract
Using soda-lime glass with a nano-stripe pattern as a test specimen, we demonstrated self-organized near-field etching with a continuum-wave laser (λ=532 nm) light source. Atomic force microscopy confirmed that near-field etching decreases the flank roughness of the corrugations as well as the roughness of the flat surface.
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Open Access This is an open access article distributed under the terms of the Creative Commons Attribution Noncommercial License (https://creativecommons.org/licenses/by-nc/2.0), which permits any noncommercial use, distribution, and reproduction in any medium, provided the original author(s) and source are credited.
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Yatsui, T., Hirata, K., Tabata, Y. et al. Self-organized near-field etching of the sidewalls of glass corrugations. Appl. Phys. B 103, 527–530 (2011). https://doi.org/10.1007/s00340-011-4569-1
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DOI: https://doi.org/10.1007/s00340-011-4569-1