Abstract
Chemical etching of single-crystalline (100)Si induced by pulsed laser irradiation at 308, 423, and 583 nm has been investigated as a function of the laser fluence and C12 pressure. Without laser-induced surface melting, etching requires Cl radicals which are produced only at laser wavelengths below 500 nm. With low laser fluences (Φ(308 nm)<100 mJ/cm2) etching is non-thermal and based on direct interactions between photocarriers and Cl radicals. For fluences which induce surface melting (Φ(308 nm)>440 mJ/cm2) etching is thermally activated. In the intermediate region both thermal and non-thermal mechanisms contribute to the etch rate.
Similar content being viewed by others
References
D. Bäuerle:Chemical Processing with Lasers, Springer Ser. Mat. Sci.1 (Springer, Berlin, Heidelberg 1986)
D.J. Ehrlich, R.M. Osgood, T.F. Deutsch: Appl. Phys. Lett.38, 1018 (1981)
H. Okano, Y. Horiike, M. Sekine: Jpn. J. Appl. Phys.24, 68 (1985)
T. Arikado, M. Sekine, H. Okano, Y. Horiike: InLaser Controlled Chemical Processing of Surfaces, ed. by A.W. Johnson, D.J. Ehrlich, H.R. Schlossberg (North-Holland, New York 1984) p. 167
T.J. Chuang, I. Hussla, W. Sesselmann: InLaser Processing and Diagnostics, ed. by D. Bäuerle, Springer Ser. Chem. Phys.39 (Springer, Berlin, Heidelberg 1984) p. 300
W. Sesselmann, T.J. Chuang: J. Vac. Sci. Technol.B3, 1507 (1985)
I.W. Boyd, J.I.B. Wilson: J. Appl. Phys.53, 6, 4166 (1982)
See, for example: H.M.v. Driel, J.E. Sipe, J.F. Young: J. Lumin.30, 446 (1985);
Z. Guosheng, P.M. Fauchet, A.E. Siegmann: Phys. Rev. B26, 5366 (1982)
R. Kullmer, D. Bäuerle: To be published
C.Y. Ho, R.W. Powell, P.E. Liley: J. Phys. Chem.3 [Suppl. 1], 588 (1974)
D. Marsal:Die Numerische Lösung Partieller Differentialgleichungen (Bibliographisches Institut, Mannheim 1976)
G.E. Jellison, F.A. Modine: Phys. Rev. B27, 12, 7466 (1983)
G.E. Jellison, F.A. Modine: Appl. Phys. Lett41, 2, 180 (1982)
S. Unamuno, M. Toulemonde, P. Siffert: InLaser Processing and Diagnostics, ed. by D. Bäuerle, Springer Ser. Chem. Phys.39 (Springer, Berlin, Heidelberg 1984) p. 35
M.C. Heaven, M.A.A. Clyne: J. Chem. Soc., Faraday Trans.78, 1339 (1982) and references therein
D.J. Seery, D. Britton: J. Phys. Chem.68, 2263 (1964)
P.K. Larsen, N.V. Smith, M. Schlüter, H.H. Farrell, K.M. Ho, M. Cohen: Phys. Rev. B17, 2612 (1978)
H.F. Winters, J.W. Coburn, T.J. Chuang: J. Vac. Sci. Technol. B1, 469 (1983)
R. Gauthier, C. Guittard: Phys. Status Solidi A38, 477 (1976)
J.S. Preston, H.M.v. Driel: Phys. Rev. B30, 1950 (1984)
B. Laurich, A. Forchel: J. Physique C5, 43 (1983)
K.G. Svantesson, N.G. Nilsson, L. Huldt: Solid State Commun.9, 213 (1971)
N.G. Nilsson, K.G. Svantesson: Solid State Commun.11, 155 (1972)
D.H. Lowndes, G.E. Jellison, R.F. Wood: Phys. Rev. B26, 6747 (1982)
T. Baller, D.J. Oostra, A.E. de Vries, G.N.A. van Veen: J. Appl. Phys.60, 2321 (1986)