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Electrochromic properties of nanocrystalline WO3 thin films grown on flexible substrates by plasma-assisted evaporation technique

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Abstract

Thin films of Tungsten trioxide (WO3) were deposited on ITO-coated flexible Kapton substrates by plasma-assisted activated reactive evaporation (ARE) technique. The influence of growth and microstructure on optoelectrochromic properties of WO3 thin films was studied. The nanocrystalline WO3 films grown at substrate temperature of 250°C were composed of vertically elongated cone-shaped grains of size 65 nm with relative density of 0.71. These WO3 films demonstrated higher optical transmittance of 85% in the visible region with estimated optical band gap of 3.39 eV and exhibited better optical modulation of 66% and coloration efficiency of 52.8 cm2/C at the wavelength of 550 nm.

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Authors and Affiliations

  1. Thin Film Laboratory, Department of Physics, Sri Venkateswara University, Tirupati, 517 502, India

    K. Hari Krishna & O. M. Hussain

  2. Institut des Nanoscience de Paris, UMR 7588, Unversite Pierre et Marie Curie, 140 Rue de Lourmel, 75015, Paris, France

    C. M. Julien

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  1. K. Hari Krishna
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  2. O. M. Hussain
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  3. C. M. Julien
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Correspondence to O. M. Hussain.

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Hari Krishna, K., Hussain, O.M. & Julien, C.M. Electrochromic properties of nanocrystalline WO3 thin films grown on flexible substrates by plasma-assisted evaporation technique. Appl. Phys. A 99, 921–929 (2010). https://doi.org/10.1007/s00339-010-5681-5

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  • DOI: https://doi.org/10.1007/s00339-010-5681-5

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