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Glancing angle sputter deposited tungsten trioxide (WO3) thin films for electrochromic applications

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Abstract

The columnar growth angle-dependent tungsten oxide (WO3) thin films were grown by using the Glancing angle sputter deposition (GLAD) technique with varying different substrate angles (00, 700, 750, and 800) on Fluorine-doped tin oxide (FTO) and Corning glass (CG) corning glass substrates at room temperature. The surface morphology, crystallographic structure, optical, and electrochemical properties were determined using X-ray diffraction (XRD), Field emission scanning electron microscopy (FE-SEM), Ultraviolet–Visible (UV–Vis) spectrometer, and electrochemical analyzer, respectively. The structural properties reveal that the films are amorphous in nature. FE-SEM studies observed the columnar growth of the nano-rods and surface porosity. The optical transmittance of the deposited films was decreased from 83 to 78%, and the optical bandgap decreased from 3.08 to 2.88 eV with increasing GLAD angle. The electrochemical studies reveal that the GLAD angle influenced the coloration efficiency (CE). The highest CE of 32 cm2/C at 600 nm and highest Diffusion coefficient (DC) of 6.529 × 10–9 cm2 s−1 of the films was observed for the films deposited at an angle of 750.

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Abbreviations

WO3 :

Tungsten oxide

GLAD:

Glancing angle sputter deposition

RF:

Radio frequency

FTO:

Fluorine doped tin oxide

CG:

Corning glass

XRD:

X-ray diffraction

FE-SEM:

Field emission scanning electron microscope

CE:

Coloration efficiency

TMO:

Transition metal oxides

CV:

Cyclic voltammograms

DC:

Diffusion coefficient

WE:

Working electrode

RE:

Reference electrode

CE:

Counter electrode

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Acknowledgements

The author acknowledges AICTE (8-39/RIFD/RPS/POLICY-1/2016) in New Delhi, India for financial support.

Funding

AICTE, 8-39/RIFD/RPS/POLICY-1/2016, Habibuddin Shaik.

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Authors and Affiliations

  1. Department of Physics, Nitte Meenakshi Institute of Technology, Yelahanka, Bangalore, 560064, India

    K Naveen Kumar, Habibuddin Shaik, Jyothi Gupta, Sheik Abdul Sattar & G V Ashok Reddy

  2. Center for Nanomaterials and MEMS, Nitte Meenakshi Institute of Technology, Yelahanka, Bangalore, 560064, India

    K Naveen Kumar, Habibuddin Shaik, Jyothi Gupta & G Nithya

  3. Department of ECE, Nitte Meenakshi Institute of Technology, Yelahanka, Bangalore, 560064, India

    G Nithya

  4. Interdisciplinary Centre for Energy Research, Indian Institute of Science, Bangalore, 560012, India

    V Madhavi

  5. Department of Physics and Electronics, Christ University, Hosur Road, Bangalore, 560029, India

    R Imran Jafri

  6. Department of Physics, SJB Institute of Technology, Kengeri, Bangalore, Karnataka, 560060, India

    G V Ashok Reddy

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  1. K Naveen Kumar
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Naveen Kumar, K., Shaik, H., Madhavi, V. et al. Glancing angle sputter deposited tungsten trioxide (WO3) thin films for electrochromic applications. Appl. Phys. A 128, 985 (2022). https://doi.org/10.1007/s00339-022-06124-5

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