Hybrid ICP/sputter deposition of TiC/CaO nanocomposite films for biomedical application

Abstract

TiC/a-C nanocomposite films doped with CaO have been deposited by means of a hybrid PVD/PACVD technique, which combines dc magnetron sputtering of a TiC_0.5+10% CaO target, with a subsequent high density inductively coupled plasma (ICP) in order to excite and ionize the sputtered species to a high degree. The films were characterized according to their morphology, structure and thickness by scanning electron microscopy, their composition and bonding structure by X-ray photoelectron spectroscopy, and their crystalline properties by X-ray diffraction. The films consist of fcc titanium carbide nanocrystallites with grain sizes of 5–15 nm and an amorphous carbon phase. The average composition is Ti_0.43C_0.35Ca_0.02O_0.15N_0.05. The influence of the ICP plasma power and the bias voltage applied to the substrate on the major film properties has been investigated. A number of such TiC/a-C/CaO nanocomposite films on silicon substrates have been subjected to a 60 day cell test with human osteoblastic cells in order to investigate their suitability for the coating of prostetic implants. The results of these cell tests, some of which turned out to be rather promising, are discussed in terms of film properties such as surface roughness and biaxial stress.