Abstract
The work on metal organic chemical vapour deposition (MOCVD) and molecular beam epitaxy (MBE) in China dates from the early seventies. This paper reviews the recent progress of MOCVD and BME, including the equipment, technique and materials, such as IV, III–V and II–VI compound semiconductors, in a number of Institutes and Universities in China.
The first part describes the design and construction of a fully automatic computer-controlled MOCVD equipment by Shanghai Institute of Metallurgy, Academia Sinica, preparation of SiGaAs/GaAlAs and GaInAs/InP superlattice, GaAs/GaAlAs heterojunction and quantum well structures and HgCdTe/CdTe/GaAs multilayer heterojunction materials and fabrication of photocathode, low noise MESFET and quantum well lasers.
The second part reviews the development of MBE systems in China, preparation of GaAs/Si and CdTe/GaAs heterostructures, GaAlAs/GaAs quantum well, modulating heterostructures and superlattices and the fabrication of multiquantum well (MQW) heterojunction lasers and MQW F-P bistable operated logic devices.
It can be seen that the MOCVD and MBE work in China is of a preliminary nature and only make a little contribution to the field of MOCVD and MBE semiconductors.
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Rui-wu, P., Mei-ying, K. & Yi-xin, J. The progress in MOCVD and MBE in China. Acta Physica Hungarica 70, 217–230 (1991). https://doi.org/10.1007/BF03156269
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DOI: https://doi.org/10.1007/BF03156269