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Lithography with silicon ions

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Abstract

Some applications of focussed ion beams are discussed with special emphasis on the lithography aspects. Experimental data on the ranges of H+, Be+ and Si++ in polymethylmethacrylate (PMMA) are presented. The sensitivity of PMMA to Si++ ions is measured to be 0.35 µC/cm2. It is shown by replication through a transmission mask that Si++ ions with low to moderate incident energies, such as found in focussed ion beam systems, can be used for submicrometer lithography in single and multi-layer resist systems.

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References

  1. R.L. Seliger, R.L. Kubena, R.D. Olney, J.W. Ward, and V. Wang, J. Vac. Sci. and Technol.16, 1610 (1979).

    Article  CAS  Google Scholar 

  2. G. Hanson and B.M. Siegel, J. Vac. Sci. and Technol.16, 1875 (1979).

    Article  CAS  Google Scholar 

  3. M. Tamura, S. Shukuri, S. Tachi, T. Ishitani, and H. Tamura, Jpn. J. Appl. Phys. 22, L698 (1983).

    Article  Google Scholar 

  4. E. Miyauchi, H. Arimoto, H. Hashimoto, and T. Utsumi, J. Vac. Sci. and Technol.Bl, 1113 (1983).

    Article  Google Scholar 

  5. Y. Bamba, E. Miyauchi, H. Arimoto, K. Kuramoto, A. Takamori, and H. Hashimoto, Jpn. J. Appl. Phys.22, L650 (1983).

    Article  Google Scholar 

  6. R.L. Kubena, C.L. Anderson, R.L. Seliger, R.A. Juliens, E.H. Stevens, and I. Lagnado, J. Vac. Sci. Technol.19, 916 (1981).

    Article  Google Scholar 

  7. M. Komuro, H. Hiroshima, H. Tanoue, and T. Kanayama, J. Vac. Sci. and Technol.Bl, 985 (1983).

    Article  Google Scholar 

  8. A. Wagner, Solid State Technol.26, 97 (1983).

    Article  Google Scholar 

  9. H. Ryssel, K. Haberger, and H. Kranz, J. Vac. Sci. and Technol.19, 1358 (1981).

    Article  CAS  Google Scholar 

  10. W.L. Brown, T. Venkatesan, and A. Wagner, Solid State Technol.24, 60 (1981).

    CAS  Google Scholar 

  11. I. Adesida, Nucl. Instr. and Methods 209/210,79 (1983).

  12. L. Karapiperis, Ph.D. Thesis (Cornell University, Ithaca, 1981) unpublished.

  13. E. Miyauchi, H. Hashimoto, and T. Utsumi, Jpn. J. Appl. Phys.22, L225 (1983).

    Article  Google Scholar 

  14. G. Stengl, R. Kaitna, H. Loschner, P. Wolf, and R. Sacher, J. Vac. Sci. and Technol.16, 1883 (1979).

    Article  CAS  Google Scholar 

  15. I. Berry, J. Vac. Sci. and Technol. Bl, 1059 (1983).

  16. H. Kuwano, K. Yoshida, and S. Yamazaki, Jpn. J. Appl. Phys.19, L615 (1980).

    Article  CAS  Google Scholar 

  17. I. Adesida, J.D. Chinn, L. Rathbun, and E.D. Wolf, J. Vac. Sci. and Technol.21, 666 (1982).

    Article  CAS  Google Scholar 

  18. D.M. Tennant, J. Vac. Sci. and Technol.Bl, 494 (1983).

    Article  Google Scholar 

  19. I. Adesida and L. Karapiperis, Radiat. Eff.61, 223 (1982).

    Article  CAS  Google Scholar 

Download references

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Authors and Affiliations

  1. National Research and Resource Facility for Submicron Structures, School of Electrical Engineering Cornell University, 14853, Ithaca, New York

    I. Adesida, M. Zhang & E. D. Wolf

Authors
  1. I. Adesida
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  2. M. Zhang
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  3. E. D. Wolf
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Additional information

This paper was presented at the 25th Electronic Materials Conference, Burlington, Vermont, June 1983

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Adesida, I., Zhang, M. & Wolf, E.D. Lithography with silicon ions. J. Electron. Mater. 13, 689–701 (1984). https://doi.org/10.1007/BF02653989

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  • DOI: https://doi.org/10.1007/BF02653989

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