Abstract
After a description of the characteristics of ion implantation, the following topics are treated: point defect trapping observed by radioactive hfi probe nuclei; decoration of probe nuclei by light interstitial atoms; internal oxidation of probe atoms in noble metal hosts; aggregation phenomena at higher implantation doses.
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Niesen, L. HFI studies of ion implantation in metals. Hyperfine Interact 26, 1035–1049 (1985). https://doi.org/10.1007/BF02354649
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DOI: https://doi.org/10.1007/BF02354649