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A mass spectrometric analysis of CF4/O2 plasmas: Effect of oxygen concentration and plasma power

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Abstract

A quadrupole mass analyzer was used to detect the neutral products extracted downstream from a CF4/O2 RF discharge at 80 mtorr. mtorr. Stable discharge products were investigated as a junction of plasma power, residence time, oxygen concentration, and plasma voltage standing-wave ratio. In general, as plasma power increased from 10 to 200 W, production of CO increased while the measured mole fractions of CO2 and COF2 stabilized. The ratio of' CO to CO, decreases! at low plasma powers as the oxygen concentration increased. ,4n increase in the relative conversion of CF4 to oxygenated products occurred at both low plasma powers and low oxygen concentrations. Chemical mechanisms are suggested to account for these results.

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Authors and Affiliations

  1. Department of Chemical Engineering, University of California at Berkeley, 94720, Berkeley, California

    J. C. Martz & D. W. Hess

  2. Materials Science and Technology Division, Los Alamos National Laboratory, 87545, Los Alamos, New Mexico

    W. E. Anderson

Authors
  1. J. C. Martz
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  2. D. W. Hess
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  3. W. E. Anderson
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Martz, J.C., Hess, D.W. & Anderson, W.E. A mass spectrometric analysis of CF4/O2 plasmas: Effect of oxygen concentration and plasma power. Plasma Chem Plasma Process 10, 261–275 (1990). https://doi.org/10.1007/BF01447130

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  • DOI: https://doi.org/10.1007/BF01447130

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