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Study of chemical bonds in a-B/C:H films by electron probe microanalysis

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Abstract

This paper describes the study of chemical bonds in amorphous hydrogen rich boron/carbon (a-B/C:H) films by electron probe microanalysis. The films were deposited on Si single crystals by plasma chemical vapour deposition with a precursor-carborane (C2B10H12) in a laboratory setup. A film thickness and B/C ratio up to a value of 8000 Å and 4, respectively, have been obtained. The analysis of boron and carbon X-ray emission spectra has shown that the nearest order in the films is characterized by the coexistence of C-C, B-C and B-B bonds for B/C ≃ 1 and of B-B and B-C bonds for B/C ≃ 4. After two years exposure in air the oxygen content in the films increases from 2–5 to 15–20 at.%.

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Authors and Affiliations

  1. Institute of Physical Chemistry, Academy of Sciences, Leninsky pr. 31, 117915, Moscow, Russia

    Renad K. Zalavutdinov, Alexander E. Gorodetsky & Andrey P. Zakharov

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  1. Renad K. Zalavutdinov
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  2. Alexander E. Gorodetsky
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  3. Andrey P. Zakharov
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Zalavutdinov, R.K., Gorodetsky, A.E. & Zakharov, A.P. Study of chemical bonds in a-B/C:H films by electron probe microanalysis. Mikrochim Acta 114, 533–537 (1994). https://doi.org/10.1007/BF01244580

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