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Method of measurement and analysis of texture in thin films

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Abstract

A method of measurement and analysis of texture in thin films is proposed. In this method, the incidence angle of the X-ray beam is low and is kept constant during the measurements. This requirement allows information to be obtained from a thin surface layer of the specimen. However, it limits the area on the pole figure from which data can be measured. Quantitative analysis of various factors and parameters which affect the X-ray penetration depth and the measured area of the pole figure is proposed. The proposed method was implemented and tested and the results obtained were used to calculate the crystal orientation distribution function.

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References

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Szpunar, J.A., Ahlroos, S. & Tavernier, P. Method of measurement and analysis of texture in thin films. J Mater Sci 28, 2366–2376 (1993). https://doi.org/10.1007/BF01151667

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  • DOI: https://doi.org/10.1007/BF01151667

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