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Optical Characterization of Thin Films by Means of Imaging Spectroscopic Reflectometry

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Optical Characterization of Thin Solid Films

Part of the book series: Springer Series in Surface Sciences ((SSSUR,volume 64))

Abstract

This chapter focuses on optical characterization of thin films by means of non-microscopic imaging spectroscopic reflectometry. This technique is primarily intended for characterization of thin films with an area non-uniformity in their optical properties. An advantage of the technique is the possibility to measure along a relatively large area of the measured films. The motivation for development and exploitation of this technique is also discussed. Essential features and implementation of the technique are given, as well as the basic experimental set-up of imaging spectroscopic reflectometers and the way the experimental data are obtained. The data processing methods are classified based on the purpose of the thin film measurement. Furthermore, this chapter presents examples of results of imaging spectroscopic reflectometry in the field of thin films. At the end of the chapter, potential applications of imaging spectroscopic reflectometry in other tasks are also briefly mentioned.

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Notes

  1. 1.

    When the gradient of thickness non-uniformity is so high (e.g. edges of thin films) that the film cannot be considered uniform within those areas, it is possible to perform correction leading to the correct results.

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Acknowledgements

The work on this chapter was supported by the project LO1411 (NPU I) funded by Ministry of Education Youth and Sports of the Czech Republic. Presented reflectometers were realized using the facilities of Institute of Physical Engineering, Brno University of Technology.

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Authors and Affiliations

  1. Institute of Physical Engineering, Brno University of Technology, Technická 2, 61669, Brno, Czech Republic

    Miloslav Ohlídal & Jiří Vodák

  2. Institute of Physics, Faculty of Mining and Geology, VŠB-Technical University of Ostrava, Ostrava, Czech Republic

    Miloslav Ohlídal

  3. Department of Physical Electronics, Masaryk University, Kotlářská 267/2, 61137, Brno, Czech Republic

    Jiří Vodák

  4. Czech Metrology Institute, Okružní 31, 63800, Brno, Czech Republic

    Jiří Vodák

  5. Plasma Technologies, CEITEC, Masaryk University, Purkyňova 123, 61200, Brno, Czech Republic

    David Nečas

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  1. Miloslav Ohlídal
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Correspondence to Miloslav Ohlídal .

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  1. Abbe School of Photonics, Friedrich-Schiller-University Jena, Jena, Thüringen, Germany

    Olaf Stenzel

  2. Institute of Physical Engineering, Brno University of Technology, Brno, Czech Republic

    Miloslav Ohlídal

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Ohlídal, M., Vodák, J., Nečas, D. (2018). Optical Characterization of Thin Films by Means of Imaging Spectroscopic Reflectometry. In: Stenzel, O., Ohlídal, M. (eds) Optical Characterization of Thin Solid Films. Springer Series in Surface Sciences, vol 64. Springer, Cham. https://doi.org/10.1007/978-3-319-75325-6_5

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