Abstract
It is shown that buried channel waveguides may be formed from a bilayer planar guide (made by plasma-enhanced chemical vapour deposition of silicon oxynitride) by bombardment with low-energy electrons. This results in an expansion of the material, and hence a decrease in the refractive index. Consequently, irradiation around a narrow stripe will induce lateral confinement. Data are presented for the electron-induced refractive index and volume changes, together with preliminary results for single-mode channel guides operating at 1.52μm wavelength.
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Lewandowski, J., Syms, R.R.A., Madden, S. et al. Buried channel waveguides in plasma-enhanced chemical vapour deposited silicon oxynitride layers on silicon substrates, formed by electron-beam irradiation. Opt Quant Electron 23, 703–711 (1991). https://doi.org/10.1007/BF00613002
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DOI: https://doi.org/10.1007/BF00613002