A new approach to modelling Kelvin probe force microscopy of hetero-structures in the dark and under illumination

  • Yong HuangEmail author
  • Alexandre Gheno
  • Alain Rolland
  • Laurent Pedesseau
  • Sylvain Vedraine
  • Olivier Durand
  • Johann Bouclé
  • James P. Connolly
  • Lioz Etgar
  • Jacky EvenEmail author
Part of the following topical collections:
  1. 2017 Numerical Simulation of Optoelectronic Devices


A numerical method is proposed to model Kelvin probe force microscopy of hetero-structures in the dark and under illumination. It is applied to FTO/TiO2 and FTO/TiO2/MAPbI3 structures. The presence of surface states on the top of the TiO2 layers are revealed by combining theoretical computation and experimental results. Basic features of Kelvin probe force microscopy under illumination, namely surface photovoltage, are simulated as well. The method paves the way toward further investigations of more complicated optoelectronic devices.


KPFM Drift–diffusion Hetero-structures SPV Halide perovskite 



The work at FOTON was supported by French ANR SupersansPlomb project. Y.H.’s work at Xlim and IPVF was supported by HPERO GDR (CNRS).


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Copyright information

© Springer Science+Business Media, LLC, part of Springer Nature 2018

Authors and Affiliations

  1. 1.INSA de Rennes, UMR 6082, CNRSFonctions Optiques pour les Technologies de l’Information (FOTON)RennesFrance
  2. 2.Université de Limoges/CNRS, UMR 7252XLIMLimoges CedexFrance
  3. 3.Institut Photovoltaïque de l’Île de France (IPVF)AntonyFrance
  4. 4.Institute of ChemistryThe Hebrew University of JerusalemJerusalemIsrael

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