Abstract
Methods for the synthesis and purification of dimethyldi(allylamino)silane, ethyldi(allylamino)silane, and methyltri(allylamino)silane were developed. The individuality and structure of the compounds were confirmed by the data of elemental analysis, IR and 1H, 13C, 29Si NMR spectroscopy. According to tensimetric data, the obtained compounds have sufficient volatility and thermal stability to be used as as precursors in the chemical vapor deposition synthesis of films. The thermodynamic characteristics of the evaporation process were determined. The composition of possible phase complexes and temperature boundaries of their existence in equilibrium with the gas phase were determined by the thermodynamic modeling method. Ethyldi(allylamino)silane can be used to obtain highly transparent films of hydrogenated silicon carbonitride by the plasma-enhanced chemical vapor deposition method.
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REFERENCES
Kuznetsov, F.A., Voronkov, M.G., Borisov, V.O., Igumenov, I.K., Kaichev, V.V., Kesler, V.G., Kirienko, V.V., Kichai, V.N., Kosinova, M.L., Kriventsov, V.V., Lebedev, M.S., Lis, A.V., Morozova, N.B., Nikulina, L.D., Rakhlin, V.I., Rumyantsev, Yu.M., Smirnova, T.P., Sulyaeva, V.S., Sysoev, S.V., Titov, A.A., Fainer, N.I., Tsyrendorzhieva, I.P., Chernyavskii, L.I., and Yakovkina, L.V., Fundamental’nyye osnovy protsessov khimicheskogo osazhdeniya plenok i struktur dlya nanoelektroniki. Seriya “Integratsionnyye proekty SO RAN” (Fundamentals of the Processes of Chemical Vapor Deposition of Films and Structures for Nanoelectronics. Series “Integration Projects of the SB RAS”), issue 37, Novosibirsk: Izd. SO RAN, 2013.
Silicon Carbide ‒ Materials, Processing and Applications in Electronic Devices, Mukherjee, M., Ed., Rijeka, Croatia: InTech, 2011.
Katamune, Y., Mori, H., Morishitab, F., and Izumi, A., Thin Solid Films, 2020, vol. 695, p. 137750. https://doi.org/10.1016/j.tsf.2019.137750
Wrobel, A.M. and Uznanski, P., Plasma Process Polym., 2021, vol. 18, art. no. e2000240. https://doi.org/10.1002/ppap.202000240
Wrobel, A.M. anmd Uznanski, P., Plasma Process Polym., 2021, vol. 18, art. no. e2000241. https://doi.org/10.1002/ppap.202000241
Reinold, L.M., Yamada, Y., Graczyk-Zajac, M., Munakata, H., Kanamura, K., and Riedel, R., J. Power Sources, 2015, vol. 282, p. 409. https://doi.org/10.1016/j.jpowsour.2015.02.074
Graczyk-Zajac, M., Wimmer, M., Neumann, C., and Riedel, R., J. Solid State Electrochem., 2015, vol. 19, p. 2763. https://doi.org/10.1007/s10008-015-2814-y
Bhat, Sh., Sasikumar, P.V.W., Molina-Luna, L., Graczyk-Zajac, M.J., Kleebe, H.-J., and Riedel, R., C (J. Carbon Res.), 2016, vol. 2, p. 9. https://doi.org/10.3390/c2020009
Bhandavat, R. and Singh, G., ACS Appl. Mater. Interfaces, 2012, vol. 4, p. 5092. https://doi.org/10.1021/am3015795
Kraushaar, K., Herbig, M., Schmidt, D., Wagler, J., Bohme, U., and Kroke, E., Z. Naturforsch., 2017, vol. 72, p. 909. https://doi.org/10.1515/znb-2017-0149
Titov, V.A. and Kokovin, G.A., Matematika v khimicheskoi termodinamike (Mathematics in Chemical Thermodynamics), Collection of Works, Kokovin G.A., Ed., Novosibirsk: Nauka, 1980, p. 98.
Ermakova, E.N., Sysoev, S.V., Nikulina, L.D., Tsyrendorzhieva, I.P., Rakhlin, V.I., and Kosinova, M.L., Thermochim. Acta, 2015, vol. 622, p. 2. https://doi.org/10.1016/j.tca.2015.02.004
Suvorov, A.V., Termodinamicheskaya khimiya paroobraznogo sostoyaniya (Thermodynamic Chemistry of the Vapor State), Leningrad: Khimiya, 1970, p. 44.
Golubenko, A.N., Kosinova, M.L., Titov, V.A., Titov, A.A., and Kuznetsov, F.A., Thin Solid Films, 1997, vol. 293, p. 11.
Kiseleva, N.N,. Komp’yuternoye konstruirovaniye neorganicheskikh soyedineniy: ispol’zovanie baz dannykh i metodov iskusstvennogo intellekta (Computer Design of Inorganic Compounds: The Use of Databases and Artificial Intelligence Methods), Moscow: Nauka, 2005, p. 13.
Glushko, V.P., Gurvich, L.V., Veits, I.V., Medvedev, V.A., Khachkuruzov, G.A., Yungman, V.S., Bergman, G.A., Baibuz, V.F., Iorish, V.S., Aristova, N.M., Vdovin, V.N., Gorbov, S.I., Gorokhov, L.N., Gusarov, A.V., Demidova, M.S., Dorofeyeva, O.V., Ezhov, Yu.S., Yefimov, M.E., Yefimova, A.G., Yefremov, Yu.M., Zitserman, V.Yu., Kulemza, V.A., Kuratova, L.F., Leonidov, V.Ya., Moskovskaya, M.F., Nazarenko, I.I., Osina, E.L., Przheval’skii, I.N., Rogatskii, A.L., Rtishcheva, N.P., Ryabova, V.G., Sidorova, I.V., Tolmach, P.I., Tomberg, S.E., Fokin, L.R., Khait, Yu.G., Khandamirova, N.E., Khodeev, Yu.S., Shenyavskaya, E.A., Yurkov, G.N., and Yakobson, A.Y, Termodinamicheskie svoistva individual’nykh veshchestv (Thermodynamic Properties of Individual Substances), Moscow: Nauka, 1979, vol. 2, book 2.
ACKNOWLEDGMENTS
The authors are grateful to V.R. Shayapov and I.V. Yushina (Institute of Inorganic Chemistry SB RAS) for studying films by ellipsometry and spectrophotometry.
Funding
This work was carried out with financial support from the Russian foundation for basic research (project RFBR-BRICS no. 18-53-80016, synthesis of compounds and development of plasma-enhanced chemical vapor deposition) and the Ministry of science and higher education of the Russian Federation within the framework of a state assignment (tensimetric research, modeling of chemical vapor deposition).
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Translated from Zhurnal Obshchei Khimii, 2021, Vol. 91, No. 10, pp. 1511–1518 https://doi.org/10.31857/S0044460X2110005X.
To the 90th Anniversary of A.V. Suvorov
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Sysoev, S.V., Mareev, A.V., Tsyrendorzhieva, I.P. et al. (Allylamino)silanes: Synthesis, Properties, and Prospects of Use in Producing New Materials. Russ J Gen Chem 91, 1957–1963 (2021). https://doi.org/10.1134/S1070363221100054
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DOI: https://doi.org/10.1134/S1070363221100054