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Effect of methyltrimethoxysilane hydrolysis and condensation conditions on the properties of thin polymethylsilsesquioxane films

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Abstract

We have studied the influence of methyltrimethoxysilane hydrolysis and condensation conditions in aprotic solvents on the formation, composition, and properties of thin polymethylsilsesquioxane films. The condensation of silanol groups and the structuring of the silicon–oxygen skeleton at different heat-treatment temperatures have been investigated by IR spectroscopy. The dielectric permittivity k and refractive index n of the films have been determined as functions of annealing temperature t a: at t a = 430°C, k = 2.75 and n = 1.38.

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Authors and Affiliations

  1. Moscow Technological University (MIREA), pr. Vernadskogo 78, Moscow, 119454, Russia

    R. N. Nenashev, N. M. Kotova, A. S. Vishnevskii & K. A. Vorotilov

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  1. R. N. Nenashev
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  2. N. M. Kotova
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  3. A. S. Vishnevskii
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  4. K. A. Vorotilov
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Correspondence to R. N. Nenashev.

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Original Russian Text © R.N. Nenashev, N.M. Kotova, A.S. Vishnevskii, K.A. Vorotilov, 2016, published in Neorganicheskie Materialy, 2016, Vol. 52, No. 6, pp. 679–683.

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Nenashev, R.N., Kotova, N.M., Vishnevskii, A.S. et al. Effect of methyltrimethoxysilane hydrolysis and condensation conditions on the properties of thin polymethylsilsesquioxane films. Inorg Mater 52, 625–629 (2016). https://doi.org/10.1134/S0020168516060108

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  • DOI: https://doi.org/10.1134/S0020168516060108

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