Skip to main content
SpringerLink
Log in

Atomic Layer Deposition of Thin Films onto 3D Nanostructures: The Effect of Wall Tilt Angle and Aspect Ratio of Trenches

  • PHYSICAL ELECTRONICS
  • Published:
Technical Physics Aims and scope Submit manuscript

Abstract

A theoretical model predicting the spatial profile of a film grown on walls by atomic layer deposition (ALD) is developed. The possible initial nonverticality of trench walls and the dynamic variation of the aspect ratio of the structure in the process of film growth in nanosized trenches are considered in this model. The dependence of the resulting film thickness and conformity on ALD process parameters is studied theoretically.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Fig. 1.
Fig. 2.
Fig. 3.
Fig. 4.
Fig. 5.
Fig. 6.
Fig. 7.
Fig. 8.

Similar content being viewed by others

REFERENCES

  1. Atomic Layer Deposition of Nanostructured Materials, Ed. by N. Pinna and M. Knez (Wiley, 2012).

    Google Scholar 

  2. C. Wulu, R. C. Saraswat, and J. P. McVittie, J. Electrochem. Soc. 138, 1831 (1991).

    Article  Google Scholar 

  3. J. W. Elam, D. Routkevitch, P. P. Mardilovich, and S. M. George, Chem. Mater. 15, 3507 (2003).

    Article  Google Scholar 

  4. M. Rose and J. W. Bartha, Appl. Surf. Sci. 255, 6620 (2009).

    Article  ADS  Google Scholar 

  5. H. C. M. Knoops, E. Langereis, M. C. M. van de Sanden, and M. M. Kessels, J. Electrochem. Soc. 57, G241 (2010).

    Article  Google Scholar 

  6. A. Yanguas-Gil and J. W. Elam, ECS Trans. 41, 169 (2011).

    Article  Google Scholar 

  7. A. Yanguas-Gil and J. W. Elam, Chem. Vap. Deposition 18, 46 (2012).

    Article  Google Scholar 

  8. A. V. Fadeev, A. V. Myakon’kikh, and K. V. Rudenko, Tech. Phys. 63, 235 (2018).

    Article  Google Scholar 

Download references

Author information

Authors and Affiliations

  1. Insitute of Physics and Technology, Russian Academy of Sciences, 117218, Moscow, Russia

    A. V. Fadeev & K. V. Rudenko

Authors
  1. A. V. Fadeev
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. K. V. Rudenko
    View author publications

    You can also search for this author in PubMed Google Scholar

Corresponding author

Correspondence to A. V. Fadeev.

Additional information

Translated by D. Safin

Rights and permissions

Reprints and permissions

About this article

Check for updates. Verify currency and authenticity via CrossMark

Cite this article

Fadeev, A.V., Rudenko, K.V. Atomic Layer Deposition of Thin Films onto 3D Nanostructures: The Effect of Wall Tilt Angle and Aspect Ratio of Trenches. Tech. Phys. 63, 1525–1532 (2018). https://doi.org/10.1134/S1063784218100092

Download citation

  • Received:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1134/S1063784218100092

Keywords

Search

Navigation