Abstract
The results of studies of the surface morphology, electrical characteristics, and photoluminescence properties of epitaxial GaAs films grown by molecular-beam epitaxy on GaAs(110) substrates and doped with Si are reported. A series of samples is grown at a temperature of 580°C with the arsenic/gallium flow ratio in the range from 14 to 80. By analyzing the photoluminescence spectra of the samples, the behavior of Si atoms in GaAs is interpreted with consideration for the occupation of Ga or As sites by Si atoms (i.e., for the formation of SiGa and SiAs point defects) and the formation of vacancies of arsenic and gallium VAs and VGa. In the analysis, the photoluminescence spectra of the samples on (110)-oriented substrates are compared with the photoluminescence spectra of similar samples on (100)- and (111)A-oriented substrates.
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The study was supported by the Russian Foundation for Basic Research, project no. 18-32-20207 mol_a_ved.
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Translated by E. Smorgonskaya
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Galiev, G.B., Klimov, E.A., Pushkarev, S.S. et al. Silicon-Doped Epitaxial Films Grown on GaAs(110) Substrates: the Surface Morphology, Electrical Characteristics, and Photoluminescence Spectra. Semiconductors 54, 1417–1423 (2020). https://doi.org/10.1134/S1063782620110093
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DOI: https://doi.org/10.1134/S1063782620110093