Abstract
The problem of the optimal choice of parameters of the empirical tight-binding method to simulate the quantum-confined levels of Si nanocrystals embedded into an amorphous SiO2 matrix is studied. To account for tunneling from nanocrystals to SiO2, the amorphous matrix is considered as a virtual crystal with a band structure similar to that of SiO2 β-cristobalite and with a lattice constant matched to the lattice constant of bulk Si. The electron density distributions in k space for electrons and holes quantum-confined in a Si nanocrystal in SiO2 are calculated in a wide energy region, which provides a means to see clearly the possibility of the existence of efficient direct optical transitions for hot electrons at the upper quantum-confined levels.
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ACKNOWLEDGMENTS
The study was supported in part by the Russian Foundation for Basic Research, project nos. 16-02-00337 and 18-52-54002, and the Presidium of the Russian Academy of Sciences, program no. 31.
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Translated by E. Smorgonskaya
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Belolipetskiy, A.V., Nestoklon, M.O. & Yassievich, I.N. Simulation of Electron and Hole States in Si Nanocrystals in a SiO2 Matrix: Choice of Parameters of the Empirical Tight-Binding Method. Semiconductors 52, 1264–1268 (2018). https://doi.org/10.1134/S1063782618100020
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DOI: https://doi.org/10.1134/S1063782618100020