Abstract
ZnO:Al films are produced by sol–gel deposition at temperatures of 350–550°C, using different types of reagents. Atomic-force microscopy, X-ray diffraction analysis, Raman spectroscopy, and optical transmittance measurements are used to study the dependence of the structural, morphological, and optical properties of the ZnO:Al coatings on the conditions of deposition. The optical conditions for the production of ZnO:Al layers with preferred orientation in the [001] direction and distinguished by small surface roughness are established. The layers produced in the study possess optical transmittance at a level of up to 95% in a wide spectral range and can be used in optoelectronic devices.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
S. Iwatsubo, Vacuum 80, 708 (2006).
S. Calnan and A. Tiwari, Thin Solid Films 518, 1839 (2010).
P. Görrn, T. Rabe, T. Riedl, W. Kowalsky, F. Galbrecht, and U. Scherf, Appl. Phys. Lett. 89, 161113 (2006).
C. H. Ahn, H. Kim, and H. K. Cho, Thin Solid Films 519, 747 (2010).
T. Tynell, H. Yamauchi, M. Karppinen, R. Okazaki, and I. Terasaki, J. Vac. Sci. Technol. A 31, 01A109 (2013).
M. Snure and A. Tiwari, J. Appl. Phys. 101, 124912 (2007).
C. H. Ahn, J. H. Kim, and H. K. Cho, J. Electrochem. Soc. 159, H384 (2012).
D.-W. Kang, J.-Y. Kwon, J. Shim, H.-M. Lee, and M.-K. Han, Sol. Energy Mater. Solar Cells 101, 308 (2012).
Weifeng Yang, Zhengyun Wu, Zhuguang Liu, Aisuo Pang, Yu-Li Tu, and Zhe Chuan Feng, Thin Solid Films 519, 31 (2010).
Shan Peng Cao, Fei Ye, Bo Hou, and Ai Yan Xu, Thin Solid Films 545, 205 (2013).
Y. Y. Chen, J. R. Yang, S. L. Cheng, and M. Shiojiri, Thin Solid Films 545, 183 (2013).
C. Weigand, R. Crisp, C. Ladam, T. Furtak, R. Collins, J. Grepstad, and H. Weman, Thin Solid Films 545, 124 (2013).
I. Volintiru, M. Creatore, B. J. Kniknie, C. I. M. A. Spee, and M. C. M. van de Sanden, J. Appl. Phys. 102, 043709 (2007).
Verma, F. Khan, D. Kumar, M. Kar, B. C. Chakravarty, S. N. Singh, and M. Husain, Thin Solid Films 518, 2649 (2010).
A. M. P. Santos and E. J. P. Santos, Thin Solid Films 516, 6210 (2008).
K. S. Hwang, B. A. Kang, J. H. Jeong, Y. S. Jeon, and B. H. Kim, Curr. Appl. Phys. 7, 421 (2007).
D. Guo, K. Sato, S. Hibino, T. Takeuchi, H. Bessho, and K. Kato, Thin Solid Films 550, 250 (2014).
H. Segawa, H. Sakurai, R. Izumi, T. Hayashi, T. Yano, and S. Shibata, J. Mater. Sci. 46, 3537 (2011).
M. Ohyaama, H. Kosuka, and T. Yoko, Thin Solid Films 306, 78 (1997).
T. Damen, S. Porto, and B. Tell, Phys. Rev. 142, 570 (1966).
C. A. Arguello, D. L. Rousseau, and S. P. S. Porto, Phys. Rev. 181, 1351 (1969).
R. Cuscó, E. Alarcón-Lladó, J. Ibáñez, L. Artús, J. Jiménez, B. Wang, and M. J. Callahan, Phys. Rev. B 75, 165202 (2007).
J. Serrano, F. J. Manjon, A. H. Romero, F. Widulle, R. Lauck, and M. Cardona, Phys. Rev. Lett. 90, 055510 (2003).
Yanqiu Huang, Meidong Liu, Zhen Li, Yike Zeng, and Shaobo Liu, Mater. Sci. Eng. B 97, 111 (2003).
I. Lorite, L. Villaseca, P. Díaz-Carrasco, M. Gabás, and J. L. Costa-Krämer, Thin Solid Films 548, 657 (2013).
Author information
Authors and Affiliations
Corresponding author
Additional information
Original Russian Text © E.P. Zaretskaya, V.F. Gremenok, A.V. Semchenko, V.V. Sidsky, R.L. Juskenas, 2015, published in Fizika i Tekhnika Poluprovodnikov, 2015, Vol. 49, No. 10, pp. 1297–1303.
Rights and permissions
About this article
Cite this article
Zaretskaya, E.P., Gremenok, V.F., Semchenko, A.V. et al. Structural properties of ZnO:Al films produced by the sol–gel technique. Semiconductors 49, 1253–1258 (2015). https://doi.org/10.1134/S1063782615100280
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1134/S1063782615100280