Abstract
The purpose of this study was to investigate the effects of Zr interlayer on the structure and mechanical properties of TiAlN films, which were deposited on the M2 high-speed steel substrates by means of plasma-enhanced magnetron sputtering. The result shows that the crystal orientation of Zr/TiAlN films is similar to that of single-layered TiAlN films, but the difference is that AlN (111) of Zr/TiAlN films disappears completely. With respect to Zr interlayer, the texture coefficient of Zr/TiAlN films is approximately 1. Zr/TiAlN films exhibit a compact isometric structure, which is distinctly different from the columnar structure existing in the single-layered TiAlN films and Ti/TiAlN films. The hardness and H 3/E*2 of Zr/TiAlN films are, respectively, enhanced to be 36.6 GPa and 0.147. With a few cracks emerging around the indention, the adhesion strength of TiAlN films is obviously advanced by adding Zr metal interlayer.
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Acknowledgments
This work was financially supported by the Ministry of Industry and Information Technology of China (No. 2012ZX04003011) and the National Natural Science Foundation of China (No. 51275323). The authors appreciate the Analysis and Testing Centre of Sichuan University for XPS, XRD, and SEM measurements. The authors are also grateful for the nano-indentation tests offered by University of Science and Technology Beijing and the Rockwell indentation test provided by Tool Researching Institute of Chengdu.
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Xian, G., Zhao, HB., Fan, HY. et al. Structure and mechanical properties of Zr/TiAlN films prepared by plasma-enhanced magnetron sputtering. Rare Met. 34, 717–724 (2015). https://doi.org/10.1007/s12598-014-0300-9
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DOI: https://doi.org/10.1007/s12598-014-0300-9