Abstract
In this paper, we studied the electronic properties, effective masses, and carrier mobility of monolayer \(\hbox {MoS}_2\) using density functional theory calculations. The carrier mobility was considered by means of ab initio calculations using the Boltzmann transport equation coupled with deformation potential theory. The effects of mechanical biaxial strain on the electronic properties, effective mass, and carrier mobility of monolayer \(\hbox {MoS}_2\) were also investigated. It is demonstrated that the electronic properties, such as band structure and density of state, of monolayer \(\hbox {MoS}_2\) are very sensitive to biaxial strain, leading to a direct–indirect transition in semiconductor monolayer \(\hbox {MoS}_2\). Moreover, we found that the carrier mobility and effective mass can be enhanced significantly by biaxial strain and by lowering temperature. The electron mobility increases over 12 times with a biaxial strain of 10%, while the carrier mobility gradually decreases with increasing temperature. These results are very useful for the future nanotechnology, and they make monolayer \(\hbox {MoS}_2\) a promising candidate for application in nanoelectronic and optoelectronic devices.
Similar content being viewed by others
References
A.K. Geim and K.S. Novoselov, Nat. Mater. 6(3), 183 (2007).
K. Novoselov, A. Geim, S. Morozov, D. Jiang, M. Katsnelson, I. Grigorieva, S. Dubonos, and A. Firsov, Nature 438(7065), 197 (2005).
Q. Tang, Z. Zhou, and Z. Chen, WIREs Comput. Mol. Sci 5(5), 360 (2015).
A.C. Neto, F. Guinea, N.M. Peres, K.S. Novoselov, and A.K. Geim, Rev. Mod. Phys. 81(1), 109 (2009).
M. Chhowalla, H.S. Shin, G. Eda, L.J. Li, K.P. Loh, and H. Zhang, Nat. Chem. 5(4), 263 (2013).
A.M. van der Zande, P.Y. Huang, D.A. Chenet, T.C. Berkelbach, Y. You, G.H. Lee, T.F. Heinz, D.R. Reichman, D.A. Muller, and J.C. Hone, Nat. Mater. 12(6), 554 (2013).
Y. Li, D. Wu, Z. Zhou, C.R. Cabrera, and Z. Chen, J. Phys. Chem. Lett. 3(16), 2221 (2012).
Y. Jing, E.O. Ortiz-Quiles, C.R. Cabrera, Z. Chen, and Z. Zhou, Electrochim. Acta 147, 392 (2014).
C.V. Nguyen, N.N. Hieu, N.A. Poklonski, V.V. Ilyasov, L. Dinh, T.C. Phong, L.V. Tung, and H.V. Phuc, Phys. Rev. B (accepted for publication) (2017).
K.K. Liu, W. Zhang, Y.H. Lee, Y.C. Lin, M.T. Chang, C.Y. Su, C.S. Chang, H. Li, Y. Shi, H. Zhang, et al., Nano Lett. 12(3), 1538 (2012).
Y.H. Lee, X.Q. Zhang, W. Zhang, M.T. Chang, C.T. Lin, K.D. Chang, Y.C. Yu, J.T.W. Wang, C.S. Chang, L.J. Li, et al., Adv. Mater. 24(17), 2320 (2012).
R.J. Smith, P.J. King, M. Lotya, C. Wirtz, U. Khan, S. De, A. O’Neill, G.S. Duesberg, J.C. Grunlan, G. Moriarty, et al., Adv. Mater. 23(34), 3944 (2011).
K.F. Mak, C. Lee, J. Hone, J. Shan, and T.F. Heinz, Phys. Rev. Lett. 105(13), 136805 (2010).
B. Radisavljevic, A. Radenovic, J. Brivio, I.V. Giacometti, and A. Kis, Nat. Nanotechnol. 6(3), 147 (2011)
Z. Yin, H. Li, H. Li, L. Jiang, Y. Shi, Y. Sun, G. Lu, Q. Zhang, X. Chen, and H. Zhang, ACS Nano 6(1), 74 (2011).
S. Lebegue and O. Eriksson, Phys. Rev. B 79(11), 115409 (2009).
E. Scalise, M. Houssa, G. Pourtois, V. Afanasev, and A. Stesmans, Nano Res. 5(1), 43 (2012).
L. Dong, R.R. Namburu, T.P. ORegan, M. Dubey, and A.M. Dongare, J. Mater. Sci. 49(19), 6762 (2014).
L. Wei, C. Jun-fang, H. Qinyu, and W. Teng, Physica B 405(10), 2498 (2010).
W.B. Xu, B.J. Huang, P. Li, F. Li, C.w. Zhang, and P.J. Wang, Nanoscale Res. Lett. 9(1), 1 (2014).
A. Kumar and P. Ahluwalia, Mater. Chem. Phys. 135(2), 755 (2012).
H. Shi, H. Pan, Y.W. Zhang, and B.I. Yakobson, Phys. Rev. B 87(15), 155304 (2013).
K.P. Dhakal, D.L. Duong, J. Lee, H. Nam, M. Kim, M. Kan, Y.H. Lee, and J. Kim, Nanoscale 6(21), 13028 (2014).
L.P. Feng, J. Su, S. Chen, and Z.T. Liu, Mater. Chem. Phys. 148(1), 5 (2014).
W. Shi, Z. Wang, Z. Li, and Y.Q. Fu, Mater. Chem. Phys. 183, 392 (2016).
Y. Jing, X. Tan, Z. Zhou, and P. Shen, J. Mater. Chem. A 2(40), 16892 (2014).
C. Ataca and S. Ciraci, J. Phys. Chem. C 115(27), 13303 (2011).
Y. Wang, S. Li, and J. Yi, Sci. Rep. 6 (2016)
Z. Wang, Q. Su, G. Yin, J. Shi, H. Deng, J. Guan, M. Wu, Y. Zhou, H. Lou, and Y.Q. Fu, Mater. Chem. Phys. 147(3), 1068 (2014).
M. Nayeri, M. Fathipour, and A.Y. Goharrizi, J. Phys. D Appl. Phys. 49(45), 455103 (2016).
A. Sengupta, R.K. Ghosh, and S. Mahapatra, IEEE Trans. Electron Dev. 60(9), 2782 (2013).
L. Yang, X. Cui, J. Zhang, K. Wang, M. Shen, S. Zeng, S.A. Dayeh, L. Feng, and B. Xiang, Sci. Rep. 4 (2014)
D. Lloyd, X. Liu, J.W. Christopher, L. Cantley, A. Wadehra, B.L. Kim, B.B. Goldberg, A.K. Swan, and J.S. Bunch, Nano Lett. 16(9), 5836 (2016).
K.P. Dhakal, S. Roy, H. Jang, X. Chen, W.S. Yun, H. Kim, J.D. Lee, J. Kim, and J.H. Ahn, Chem. Mater. 6, 13028 (2014).
Y. Li, Z. Zhou, S. Zhang, and Z. Chen, J. Am. Chem. Soc. 130(49), 16739 (2008).
C.V. Nguyen, V.V. Ilyasov, H.V. Nguyen, and H.N. Nguyen, Mol. Simul. 43(2), 86 (2017).
J.P. Perdew, K. Burke, and Y. Wang, Phys. Rev. B 54, 16533 (1996).
P. Giannozzi, S. Baroni, N. Bonini, M. Calandra, R. Car, C. Cavazzoni, D. Ceresoli, G.L. Chiarotti, M. Cococcioni, I. Dabo, A.D. Corso, S. de Gironcoli, S. Fabris, G. Fratesi, R. Gebauer, U. Gerstmann, C. Gougoussis, A. Kokalj, M. Lazzeri, L. Martin-Samos, N. Marzari, F. Mauri, R. Mazzarello, S. Paolini, A. Pasquarello, L. Paulatto, C. Sbraccia, S. Scandolo, G. Sclauzero, A.P. Seitsonen, A. Smogunov, P. Umari, and R.M. Wentzcovitch, J. Phys. Conden. Matter 21(39), 395502 (2009)
J. Bardeen and W. Shockley, Phys. Rev. 80, 72 (1950).
F. Beleznay, F. Bogár, and J. Ladik, J. Chem. Phys. 119(11), 5690 (2003).
C. Ataca, H. Sahin, E. Akturk, and S. Ciraci, J. Phys. Chem. C 115(10), 3934 (2011).
P. Johari and V.B. Shenoy, ACS Nano 6(6), 5449 (2012).
J. Wilson and A. Yoffe, Adv. Phys. 18(73), 193 (1969).
H. RamakrishnaMatte, A. Gomathi, A. Manna, D. Late, R. Datta, S. Pati, and C. Rao, Angew. Chem. Int. Ed. 49(24), 4059 (2010).
A. Lu and R. Zhang, Solid State Commun. 145(5), 275 (2008).
C. Zhang, A. De Sarkar, and R.Q. Zhang, J. Phys. Chem. C 115(48), 23682 (2011).
J.W. Jiang, H.S. Park, and T. Rabczuk, Nanoscale 6(7), 3618 (2014).
Y. Cai, G. Zhang, and Y.W. Zhang, J. Am. Chem. Soc. 136(17), 6269 (2014).
W.S. Yun, S.W. Han, S.C. Hong, I.G. Kim, and R J.D. Lee, Phys. Rev. B 85, 033305 (2012)
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Phuc, H.V., Hieu, N.N., Hoi, B.D. et al. Tuning the Electronic Properties, Effective Mass and Carrier Mobility of MoS2 Monolayer by Strain Engineering: First-Principle Calculations. J. Electron. Mater. 47, 730–736 (2018). https://doi.org/10.1007/s11664-017-5843-8
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s11664-017-5843-8