Abstract
The etch rates of NH4OH:H2O2 and C6H8O7:H2O2 for GaAs and GaSb have been investigated to develop a selective etch for GaAs substrates and to isolate GaSb epilayers grown on GaAs. The NH4OH:H2O2 solution has a greater etch rate differential for the GaSb/GaAs material system than C6H8O7:H2O2 solution. The selectivity of NH4OH:H2O2 for GaAs/GaSb under optimized etch conditions has been observed to be as high as 11,000 ± 2000, whereas that of C6H8O7:H2O2 has been measured up to 143 ± 2. The etch contrast has been verified by isolating 2-μm-thick GaSb epilayers that were grown on GaAs substrates. GaSb membranes were tested and characterized with high- resolution x-ray diffraction and atomic force microscopy.
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P.Y. Delaunay, B.M. Nguyen, D. Hofman, and M. Razeghi, Appl. Phys. Lett. 91, 231106 (2007).
J.P. Perez, A. Laurain, L. Cerutti, I. Sagnes, and A. Garnache, Semicond. Sci. Technol. 25, 45021 (2010).
O. Dier, C. Lin, M. Grau, and M.C. Amann, Semicond. Sci. Technol. 9, 1250 (2004).
G.C. DeSalvo, R. Kaspi, and C.A. Bozada, J. Electrochem. Soc. 141, 3526 (1994).
B. Klein, J. Montoya, N. Gautam, and S. Krishna, Appl. Phys. A 111, 671 (2013).
E. Yablonovitch, T. Gmitter, J.P. Harbison, and R. Bhat, Appl. Phys. Lett. 51, 2222 (1987).
M. Mehta, G. Balakrishnan, S. Huang, A. Khoshakhlagh, A. Jallipalli, P. Patel, M.N. Kutty, L.R. Dawson, and D.L. Huffaker, Appl. Phys. Lett. 89, 211110 (2006).
M. Mehta, A. Jallipalli, J. Tatebayashi, M.N. Kutty, A. Albrecht, G. Balakrishnan, L.R. Dawson, and D.L. Huffaker, IEEE Photon. Technol. Lett. 19, 1628 (2007).
E. Plis, J.B. Rodriguez, G. Balakrishnan, Y.D. Sharma, H.S. Kim, T. Rotter, and S. Krishna, Semicond. Sci. Tech. 25, 085010 (2010).
K.C. Nunna, S.L. Tan, C.J. Reyner, A.R.J. Marshall, B. Liang, A. Jallipalli, J.P.R. David, and D.L. Huffaker, IEEE Photon. Technol. Lett. 24, 218 (2012).
S.H. Huang, G. Balakrishnan, A. Khoshakhlagh, A. Jallipalli, L.R. Dawson, and D.L. Huffaker, Appl. Phys. Lett. 88, 131911 (2006).
C. Carter-Coman, R. Bicknell-Tassius, R.G. Benz, A.S. Brown, and N.M. Jokerst, J. Electrochem. Soc. 144, L29 (1997).
H.J.J. Yeh and J.S. Smith, Appl. Phys. Lett. 64, 1466 (1994).
A. Jallipalli, G. Balakrishnan, S.H. Huang, T.J. Rotter, K. Nunna, B.L. Liang, L.R. Dawson, and D.L. Huffaker, Nanoscale Res. Lett. 4, 1458 (2009).
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Renteria, E.J., Muniz, A.J., Addamane, S.J. et al. Isolating GaSb Membranes Grown Metamorphically on GaAs Substrates Using Highly Selective Substrate Removal Etch Processes. J. Electron. Mater. 44, 1327–1331 (2015). https://doi.org/10.1007/s11664-015-3625-8
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DOI: https://doi.org/10.1007/s11664-015-3625-8