Abstract
Magnetoresistance phenomenon on organic semiconductors has been studied mostly on spin-coated or vacuum thermal sublimated materials. In this work, electrochemistry is used as organic deposition technique. We report electrical measurements with an applied magnetic field on devices constructed in the sandwich structure indium tin oxide (ITO)/poly(bithiophene) (PBT)/aluminum (Al). The PBT polymer was electrochemically deposited on ITO. Hole mobility of 2.6 × 10−5 cm2/Vs was measured by impedance spectroscopy measurements, and thermally stimulated current measurements indicated two trapping states with activation energies around E 1–3 = 0.49 eV and E 4 = 0.51 eV. The interface ITO/PBT was characterized as a tunneling junction with ~0.9 eV energy barrier for hole injection from ITO. The highest magnetoresistance, ~0.6 %, was observed for a 273-nm PBT thickness, independent on direction between current and magnetic field.
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Forrest SR, Thompson ME (2007) Chem Rev 107:923–925
Kalinowski J, Szmytkowski J, Stampor W (2003) Chem Phys Lett 378:380–387
Francis TL, Mermer O, Veeraraghavan G, Wohlgenannt M (2004) New J Phys 6:185–192
Tolstov IV, Belov AV, Kaplunov MG, YakuschenkoI K, Spitsina NG, Triebel MM, Frankevich EL (2005) J Lumin 112:368–371
Prigodin VN, Bergeson JD, Lincoln DM, Epstein AJ (2006) Synth Met 156:757–761
Bobbert PA, Nguyen TD, Oost FWA, Koopmans B, Wohlgenannt M (2007) Phys Rev Lett 99:216801-1–216801-4
Desai P, Shakya P, Kreouzis T, Gillin WP, Morley NA, Gibbs MRJ (2007) Phys Rev B 75:094423-1–094423-5
Hu B, Wu Y (2007) Nat Mater 6:985–991
Bloom FL, Wagemans W, Kemerink M, Koopmans B (2008) Appl Phys Lett 93:263302-1–263302-3
Bagnich SA, Niedermeier U, Melzer C, Sarfert W, Seggern H (2009) J Appl Phys 105:123706-1–123706-6
Ding BF, Yao Y, Sun ZY, Wu CQ, Gao XD, Wang ZJ, Ding XM, Choy WCH, Hou XY (2010) Appl Phys Lett 97:163302-1–163302-3
Reichert T, Saragi TPI (2011) Appl Phys Lett 98:063307-1–063307-3
Kersten SP, Schellekens AJ, Koopmans B, Bobbert PA (2011) Phys Rev Lett 106:197402-1–197402-4
Gómez JA, Castro FA, Nüesch F, Zuppiroli L, Graeff CFO (2012) Appl Phys A 108:727–731
Meruvia MS, Freire JA, Hummelgen IA, Gruber J, Graeff CFO (2007) Org Electron 8:695–701
Janssen P, Cox M, Wouters SHW, Kemerink M, Wienk MM, Koopmans B (2013) Nat Commun 4:2286–2293
Gautam BR, Nguyen TD, Ehrenfreund E, Vardeny ZV (2013) J Appl Phys 113:143102-1–143102-7
Foroughi J, Spinks GM, Ghorbani SR, Kozlov ME, Safaei F, Peleckis G, Wallace GG, Baughman RH (2012) Nanoscale 4:940–945
Juttner K (2007) Technical Scale of Electrochemistry In: Macdonald DD, SchmukiP (eds) Vol. 5 Electrochemical Engineering In: Bard AJ, Stratmann M (eds) Encyclopedia of Electrochemistry, Wiley-VCH, Weinheim
Leguenza EL, Patyk RL, Mello RMQ, Micaroni L, Koehler M, Hummelgen IA (2007) J Solid State Electrochem 11:577–580
Tavares ACB, Serbena JPM, Hummelgen IA, Meruvia MS (2014) Org Electron 15:738–742
Koehler M, Hummelgen IA (1997) Appl Phys Lett 70:3254–3256
Barsoukov E, Macdonald JR (2005) Impedance spectroscopy - theory, experiment, and applications. Wiley-Interscience, New Jersey
Martens HCF, Brom HB, Blom PWM (1999) Phys Rev B 60:R8489–R8492
Martens HCF, Huiberts JN, Blom PWM (2000) Appl Phys Lett 77:1852–1854
Harima Y, Kunugi Y, Yamashita K, Shiotani M (2000) Chem Phys Lett 317:310–314
Kim Y, Cook S, Tuladhar SM, Choulis SA, Nelson J, Durrant JR, Bradley DDC, Giles M, McCulloch I, Ha C, Ree M (2006) Nat Mater 5:197–203
Chellappan V, Ng GM, Tan MJ, Goh WP, Zhu F (2009) Appl Phys Lett 95:263305-1–263305-3
Kawano K, Adachi C (2009) Adv Funct Mater 19:3934–3940
Alagiriswamy AA, Narayan KS (2001) Synth Met 116:297–299
Nikitenko VR, Heil H, Seggern H (2003) J Appl Phys 94:2480–2485
Pranaitis M, Janonis V, Sakavicius A, Kazukauskas V (2011) Semicond Sci Technol 26:085021-1–085021-5
Schafferhans J, Baumann A, Deibel C, Dyakonov V (2008) Appl Phys Lett 93:093303-1–093303-3
Simmons JG, Taylor GW (1972) Phys Rev B 5:1619–1629
Bässler H (1993) Phys Status Solidi B 175:15–56
Fang Z, Shan L, Schlesinger TE, Milnes AG (1990) Mater Sci Eng B 5:397–408
Acknowledgments
The authors would like to thank Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq), Universidade Federal do Paraná (UFPR), and Institutos Lactec for financial and technical support, and Prof. Ivo A. Hummelgen for fruitful discussions and laboratory facilities.
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Souza, J.d.F.P., Kowalski, E.L., Akcelrud, L.C. et al. Magnetoresistance in electrochemically deposited polybithiophene thin films. J Solid State Electrochem 18, 3491–3497 (2014). https://doi.org/10.1007/s10008-014-2576-y
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DOI: https://doi.org/10.1007/s10008-014-2576-y