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NMR Cryoporometry Characterization of Mesoporous Silicon

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Handbook of Porous Silicon

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Abstract

Nuclear magnetic resonance (NMR) cryoporometry is an experimental technique for the structural characterization of mesoporous materials. In this updated review, different aspects of its application to study details of the pore structure in mesoporous silicon are presented. In particular, the information obtained with the help of NMR cryoporometry is compared to that assessed using more conventional gas sorption techniques. The potentials of NMR cryoporometry to reveal fine details of the pore structure in intentionally nanostructured mesoporous silicon are demonstrated. The technique’s ability to monitor structural evolution in liquids is also starting to find uses in biomedical applications such as drug delivery.

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Authors and Affiliations

  1. Felix Bloch Institute for Solid State Physics, University of Leipzig, Linnéstr. 5, 04103, Leipzig, Germany

    Rustem Valiullin

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  1. Rustem Valiullin
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Correspondence to Rustem Valiullin .

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Editors and Affiliations

  1. Malvern Hills Science Park, Chief Scientific Officer, Intrinsiq Mate, Malvern, Worcestershire, United Kingdom

    Leigh Canham

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Valiullin, R. (2017). NMR Cryoporometry Characterization of Mesoporous Silicon. In: Canham, L. (eds) Handbook of Porous Silicon. Springer, Cham. https://doi.org/10.1007/978-3-319-04508-5_44-2

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  • DOI: https://doi.org/10.1007/978-3-319-04508-5_44-2

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  • Publisher Name: Springer, Cham

  • Print ISBN: 978-3-319-04508-5

  • Online ISBN: 978-3-319-04508-5

  • eBook Packages: Springer Reference Chemistry and Mat. ScienceReference Module Physical and Materials ScienceReference Module Chemistry, Materials and Physics

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Chapter history

  1. Latest

    NMR Cryoporometry Characterization of Mesoporous Silicon
    Published:
    11 February 2017

    DOI: https://doi.org/10.1007/978-3-319-04508-5_44-2

  2. Original

    NMR Cryoporometry and Estimation of Pore Sizes in Mesoporous Silicon
    Published:
    24 May 2014

    DOI: https://doi.org/10.1007/978-3-319-04508-5_44-1

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