Depth scale calibration during sputter removal of multilayer systems by SNMS A. WucherH. Oechsner OriginalPaper Pages: 470 - 473
On the role of ion bombardment parameters in AES sputter depth profiling of Ta2O5/Ta with Ar+ and Xe+ J. ScholtesH. Oechsner OriginalPaper Pages: 474 - 477
Concentration profiles of hydrogen in technical oxidic thin films and multilayer systems W. WagnerF. RauchK. Bange OriginalPaper Pages: 478 - 480
Optical and electron spectroscopy of magneto-optical storage films D. WellerW. Reim OriginalPaper Pages: 481 - 484
SIMS investigations of titanium profiles in LiNbO3 produced by ion beam mixing and diffusion T. BremerD. KolleweW. Heiland OriginalPaper Pages: 485 - 487
Thickness measurement of thin dielectrics with electron spectroscopy D. RoßM. Maier OriginalPaper Pages: 488 - 491
High-resolution Auger electron spectroscopy of phase boundaries in TiC/TiB2 materials E. NoldH. HolleckH. Leiste OriginalPaper Pages: 492 - 497
Analysis of sputter deposited and evaporated tantalum oxide layers on SiO2 by SNMS, XPS, TDS and TRFA K. -H. MüllerV. RupertusT. Tschudi OriginalPaper Pages: 498 - 501
Comparative surface and bulk analysis of oxygen in Si3N4 powders H. JenettH. BubertE. Grallath OriginalPaper Pages: 502 - 506
In situ ion implantation for quantification in secondary-ion mass spectrometry H. Gnaser OriginalPaper Pages: 507 - 510
AES and SIMS profiling of buried silicide layers formed by 6 MeV high dose nickel implantation into silicon A. SchönbornJ. K. N. LindnerG. Friedbacher OriginalPaper Pages: 511 - 515
Dynamic examinations at photoresists by reflectance spectroscopy G. GauglitzJ. Krause-Bonte OriginalPaper Pages: 518 - 521
Surface analysis for Si-wafers using total reflection X-ray fluorescence analysis W. BerneikeJ. KnothU. Weisbrod OriginalPaper Pages: 524 - 526
Surface analytical characterization of oxide-free Si(100) wafer surfaces L. MühlhoffT. Bolze OriginalPaper Pages: 527 - 530
Investigation of deep states in thin films of hydrogenated amorphous silicon by photo-induced current transient spectroscopy J. HerionM. TapieroW. Beyer OriginalPaper Pages: 531 - 534
ESCA, SIMS, SEM and XRD investigations of Pt-10%Rh catalyst-gauzes A. P. v. RosenstielW. H. J. BruisK. H. Berresheim OriginalPaper Pages: 535 - 539
Interaction between S-organic compounds and iron surfaces M. VolmerM. StratmannH. Viefhaus OriginalPaper Pages: 545 - 545
Surface analysis methods in the investigation of corrosion inhibitor performance R. HolmD. HoltkampS. Storp OriginalPaper Pages: 546 - 554
A CEMS/AES study of the passivation of iron W. MeiselU. StummP. Gütlich OriginalPaper Pages: 555 - 560
Surface and thin film analysis in silicon technology: actual and future problems and demands B. O. KolbesenW. Pamler OriginalPaper Pages: 561 - 568
Kinetics of titanium silicide formation by rapid thermal processing W. PamlerK. WangemannA. Mitwalsky OriginalPaper Pages: 569 - 575
Quantitative determination of oxygen in silicon by combination of FTIR-spectroscopy, inert gas fusion analysis and secondary ion mass spectroscopy G. StingederS. GaraM. Grasserbauer OriginalPaper Pages: 576 - 582
Ion channeling analysis of buried epitaxial Co silicides K. KohlhofS. MantlB. Stritzker OriginalPaper Pages: 583 - 585
Detection of metallic trace impurities on Si(100) surfaces with total reflection X-ray fluorescence (TXRF) V. PenkaW. Hub OriginalPaper Pages: 586 - 589
A study of the adhesion of copper to polyimide foils using surface analytical techniques K. HornA. M. BradshawR. Schulz OriginalPaper Pages: 590 - 595
Surface analysis within the framework of The International Union of Pure and Applied Chemistry W. H. Gries OriginalPaper Pages: 596 - 597
