Effect of ion dose rate on rapid laser annealing of implanted GaAs K. MasudaK. MurakamiH. Y. Nan OriginalPaper Pages: 3 - 5
Mechanism of defect formation in low-dose oxygen implanted silicon-on-insulator material S. BagchiJ. D. LeeP. Roitman OriginalPaper Pages: 7 - 12
Thin film silicon on insulator substrates and their application to integrated circuits S. R. WilsonT. WetterothH. C. Shin OriginalPaper Pages: 13 - 21
Synthesis of metastable carbon-silicon-nitrogen compounds by ion implantation C. UsluB. ParkD. B. Poker OriginalPaper Pages: 23 - 26
Optical properties of multicomponent nanometer dimension metal colloids formed in silica by sequential ion implantation of in and Ag and In and Cu T. S. AndersonR. H. MagruderJ. E. Wittig OriginalPaper Pages: 27 - 33
The development of biaxial alignment in yttria-stabilized zirconia films fabricated by ion beam assisted deposition Kevin G. ResslerNeville SonnenbergMichael J. Cima OriginalPaper Pages: 35 - 42
Visible and infrared (1.54 μm) emission from Er-lmplanted porous Si for photonic applications Fereydoon NamavarFeng LuRichard A. Soref OriginalPaper Pages: 43 - 49
Synthesis of low resistivity complex oxides on MgO using Pt as buffer layer P. TiwariX. D. WuT. E. Mitchell OriginalPaper Pages: 51 - 55
Pulsed laser deposition and physical properties of carbon nitride thin films Z. John ZhangShoushan FanCharles M. Lieber OriginalPaper Pages: 57 - 61
Thermal expansion, molar volume and specific heat of diamond from 0 to 3000k Robert R. ReeberKai Wang OriginalPaper Pages: 63 - 67
Photolytic deposition of aluminum nitride and oxy-nitride films at temperatures ≤ 350k Gouri RadhakrishnanJeffrey R. Lince OriginalPaper Pages: 69 - 74
Al, Al/C and Al/Si implantations in 6H-SiC Mulpuri V. RaoPeter GriffithsJ. A. Freitas OriginalPaper Pages: 75 - 80
Deposition and surface treatment with intense pulsed ion beams J. C. OlsonH. A. DavisD. C. Mc Intyre OriginalPaper Pages: 81 - 85
Strain evolution and dopant activation in P-lmplanted metastable pseudomorphic Si(100)/Ge0.12Si0.88 D. Y. C. LieJ. H. SongN. D. Theodore OriginalPaper Pages: 87 - 92
SIMOX Research, development, and manufacturing Lisa P. AllenTheodore H. SmickGeoffrey Ryding OriginalPaper Pages: 93 - 97
Implantation of si under extreme conditions: The effects of high temperature and dose on damage accumulation O. W. HollandLing XieD. S. Zhou OriginalPaper Pages: 99 - 106
Dose-rate effects in silicon-implanted gallium arsenide from low to high doses C. JasperR. MortonK. S. Jones OriginalPaper Pages: 107 - 111
Low energy ion bombardment effects in gold/aluminum nitride/silicon junctions T. StacyB. Y. LiawA. H. Khan OriginalPaper Pages: 113 - 118
A study of the ion implantation damage and annealing behavior in GaSb S. IyerR. ParakkatN. Parikh OriginalPaper Pages: 119 - 124
Transient plasma shielding effects during pulsed laser ablation of materials Rajiv K. Singh OriginalPaper Pages: 125 - 129
Study of high-quality epitaxial YBCO thin films grown directly on Y-Cut LiNbO3 P. TiwariX. D. WuT. E. Mitchell OriginalPaper Pages: 131 - 135
Excimer laser-assisted planarization of thick diamond films Rajiv K. SinghDong-Gu Lee OriginalPaper Pages: 137 - 142
Pulsed laser deposition of titanium nitride and diamond-like carbon films on polymers R. D. VisputeJ. NaeayanK. Jagannadham OriginalPaper Pages: 151 - 156
Cavity formation and impurity gettering in He-implanted Si D. M. FollstaedtS. M. MyersJ. W. Medernach OriginalPaper Pages: 157 - 164
